Avalanche photodiodes have emerged as a promising technology with significant potential for various medical applications. This article presents an overview of the advancements and applications of avalanche photodiodes in the field of medical imaging. Avalanche photodiodes offer distinct advantages over traditional photodetectors, including a higher responsivity, faster response times, and superior signal-to-noise ratios. These characteristics make avalanche photodiodes particularly suitable for medical-imaging modalities that require a high detection efficiency, excellent timing resolution, and enhanced spatial resolution. This review explores the key features of avalanche photodiodes, discusses their applications in medical-imaging techniques, and highlights the challenges and future prospects in utilizing avalanche photodiodes for medical purposes. Special attention is paid to the recent progress in silicon-compatible avalanche photodiodes.

In this review the latest advances in the field of nanostructured photodetectors are considered, stating the types and materials, and highlighting the features of operation. Special attention is paid to the group-IV material photodetectors, including Ge, Si, Sn, and their solid solutions. Among the various designs, photodetectors with quantum wells, quantum dots, and quantum wires are highlighted. Such nanostructures have a number of unique properties, that made them striking to scientists’ attention and device applications. Since silicon is the dominating semiconductor material in the electronic industry over the past decades, and as germanium and tin nanostructures are very compatible with silicon, the combination of these factors makes them the promising candidate to use in future technologies.

In this article, the performance and design considerations of the planar structure of germanium on silicon avalanche photodiodes are presented. The dependences of the breakdown voltage, gain, bandwidth, responsivity, and quantum efficiency on the reverse bias voltage for different doping concentrations and thicknesses of the absorption and multiplication layers of germanium on the silicon avalanche photodiode were simulated and analyzed. The study revealed that the gain of the avalanche photodiode is directly proportional to the thickness of the multiplication layer. However, a thicker multiplication layer was also associated with a higher breakdown voltage. The bandwidth of the device, on the other hand, was inversely proportional to the product of the absorption layer thickness and the carrier transit time. A thinner absorption layer offers a higher bandwidth, but it may compromise responsivity and quantum efficiency. In this study, the dependence of the photodetectors’ operating characteristics on the doping concentration used for the multiplication and absorption layers is revealed for the first time.

Subject of study. The work studied the formation of germanium quantum dots on silicon with (100) crystallographic orientation under different growth regimes. Aim of study. The work is devoted to conducting experimental studies of the influence of growth mechanisms on the formation of germanium layers and quantum dots on a silicon (100) substrate for the production of optical elements based on silicon-germanium nanostructures. Methods. After pre-epitaxial cleaning of the Si substrate, germanium is synthesized on Si(100) through molecular beam epitaxy. The surface morphology is analyzed using reflection high-energy electron diffraction during synthesis and scanning electron microscopy after deposition. Main results. The work determines the temperature ranges at which the Si/Si(100) growth occurs due to the nucleation of islands, due to the movement of steps, and in combination. The effect of changing growth mechanisms on the size and density of Ge quantum dots on Si(100) is shown. Practical significance. The research results provide insight into the influence of growth mechanisms on the sizes of formed germanium quantum dots on silicon, which will make it possible to create nanophotonics and nanoelectronics elements with strictly specified parameters.