Erwan Rauwel

Prof. Dr. Erwan Rauwel

Estonian University of Life Sciences, Tartu, Tartumaa, Estonia
orcid

Research Focus & Metrics

Academic Career Length

26Years (2001-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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1 January 2015 in Advances in Materials Science and Engineering
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Journal Article
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Protima RauwelProtima Rauwel
Protima Rauwel
SKSiim Küünal
Siim Küünal
Stanislav FerdovStanislav Ferdov
Stanislav Ferdov
Erwan RauwelErwan Rauwel
Erwan Rauwel
Silver has been recognized as a nontoxic, safe inorganic antibacterial/antifungal agent used for centuries. Silver demonstrates a very high potential in a wide range of biological applications, more particularly in the form of nanoparticles. Environmentally friendly synthesis methods are becoming more and more popular in chemistry and chemical technologies and the need for ecological methods of synthesis is increasing; the aim is to reduce polluting reaction by-products. Another important advantage of green synthesis methods lies in its cost-effectiveness and in the abundance of raw materials. During the last five years, many efforts were put into developing new greener and cheaper methods for the synthesis of nanoparticles. The cost decrease and less harmful synthesis methods have been the motivation in comparison to other synthesis techniques where harmful reductive organic species produce hazardous by-products. This environment-friendly aspect has now become a major social issue and is instrumental in combatting environmental pollution through reduction or elimination of hazardous materials. This review describes a brief overview of the research on green synthesis of silver metal nanoparticles and the influence of the method on their size and morphology.

30 October 2008 in Nano Letters
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Journal Article
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MWMarc-Georg Willinger
Marc-Georg Willinger
GNGiovanni Neri
Giovanni Neri
Erwan RauwelErwan Rauwel
Erwan Rauwel
ABAnna Bonavita
Anna Bonavita
GMGiuseppe Micali
Giuseppe Micali
Nicola PinnaNicola Pinna
Nicola Pinna

16 December 2016 in Journal of Vacuum Science & Technology A
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Journal Article
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EAEsko Ahvenniemi
Esko Ahvenniemi
AAAndrew R. Akbashev
Andrew R. Akbashev
SASaima Ali
Saima Ali
Mikhael BECHELANYMikhael BECHELANY
Mikhael BECHELANY
MBMaria Berdova
Maria Berdova
OYOksana Yurkevich
Oksana Yurkevich
Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name “molecular layering” (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency.

3 July 2006 in Applied Physics Letters
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Erwan RauwelErwan Rauwel
Erwan Rauwel
CDC. Dubourdieu
C. Dubourdieu
BHB. Holländer
B. Holländer
NRN. Rochat
N. Rochat
FDF. Ducroquet
F. Ducroquet
BPB. Pelissier
B. Pelissier
Addition of yttrium in HfO2 thin films prepared on silicon by metal organic chemical vapor deposition is investigated in a wide compositional range (2.0–99.5at.%) . The cubic structure of HfO2 is stabilized for 6.5at.% . The permittivity is maximum for yttrium content of 6.5–10at.% ; in this range, the effective permittivity, which results from the contribution of both the cubic phase and silicate phase, is of 22. These films exhibit low leakage current density (5×10−7A∕cm2 at −1V for a 6.4nm film). The cubic phase is stable upon postdeposition high temperature annealing at 900°C under NH3 .

1 January 2018
Verified
Book Chapter
Closed access
SKSiim Küünal
Siim Küünal
Protima RauwelProtima Rauwel
Protima Rauwel
Erwan RauwelErwan Rauwel
Erwan Rauwel

15 November 2012 in Journal of Applied Physics
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Protima RauwelProtima Rauwel
Protima Rauwel
Erwan RauwelErwan Rauwel
Erwan Rauwel
CPC. Persson
C. Persson
MSM. F. Sunding
M. F. Sunding
AGAugustinas Galeckas
Augustinas Galeckas
Hafnium dioxide is a wide band-gap, high-κ material, and Hafnium based compounds have already been integrated into micro-electronic devices. The pure cubic HfO2 phase is promising as it presents a higher permittivity (κ > 25), but needs to be stabilized by addition of divalent or trivalent dopants, which in turn modify the electronic properties of HfO2. Here, we employ a one-pot synthesis approach to produce undoped cubic and monoclinic HfO2 nanoparticles by choice of solvent alone. The average size of these nanoparticles from transmission electron microscopy studies was estimated to be around 2.6 nm. We present a study of the morphology and microstructure and also demonstrate the presence of a strong visible photoluminescence linked to the nanosize of the particles. Furthermore, the synthesis in equivalent conditions of these two phases of HfO2 provides means for direct comparison of the chemical composition and electronic structures of the two polymorphs. This has therefore allowed us to experimentally elucidate similarities and differences in the valence band, band gap states, and conduction band of these pure phases seconded by first principles calculations within the density functional theory.