Prof. Zhang has 15 years of research experience in thin film growth, proficient in atomic layer deposition, magnetron sputtering and pulsed laser deposition and other thin film preparation technologies, spatially in ALD multilayer film process.
He has published more than 60 SCI papers in authoritative journals such as Adv. Funct. Mater., Chem. C., Appl. Phys. Lett., which have been cited by peers more than 1,300 times and applied for more than 10 invention patents.
Prof. Zhang has 15 years of research experience in thin film growth, proficient in atomic layer deposition, magnetron sputtering and pulsed laser deposition and other thin film preparation technologies, spatially in ALD multilayer film process.
He has published more than 60 SCI papers in authoritative journals such as Adv. Funct. Mater., Chem. C., Appl. Phys. Lett., which have been cited by peers more than 1,300 times and applied for more than 10 invention patents.