We report on highly disordered array of Au coated silicon nanowires (Au/SiNWs) as surface enhanced Raman scattering (SERS) probe combined with electrochemical detection for biosensing applications. SiNWs, few microns long, were grown by plasma enhanced chemical vapor deposition on common microscope slides and covered by Au evaporated film, 150 nm thick. The capability of the resulting composite structure to act as SERS biosensor was studied via the biotin-avidin interaction: the Raman signal obtained from this structure allowed to follow each surface modification step as well as to detect efficiently avidin molecules over a broad range of concentrations from micromolar down to the nanomolar values. The metallic coverage wrapping SiNWs was exploited also to obtain a dual detection of the same bioanalyte by electrochemical impedance spectroscopy (EIS). Indeed, the SERS signal and impedance modifications induced by the biomolecule perturbations on the metalized surface of the NWs were monitored on the very same three-electrode device with the Au/SiNWs acting as both working electrode and SERS probe.

In this work we present a study of the reflectivity from highly disordered silicon nanowire films as a function of the wire size. Arrays of Au-catalyzed Si wires with length and diameter ranging from 0.15-0.2 microm and 30-50 nm up to 20-25 microm and 200-250 nm, respectively, were grown on top of either SiO(2)(1 microm)/Si(100) or Si(100) substrates. The integrated total reflection was measured in the 190-2500 nm spectral range. The results show that, increasing the wire size, the optical behavior of the Si wire film can be gradually tuned from that of an optical coating characterized by a graded effective refractive index to that of an ensemble of diffuse optical reflectors. In addition, we show how the optical analysis provides some important indications concerning the structural properties of the nanowires.

We have studied the influence of difference growth conditions on the two-dimensional to three-dimensional growth mode transition for a specific class of InGaAs/GaAs quantum dots (QDs) optimized for applications to optical devices operating around 1.3 μm (In content x≈0.5). The dots are grown by low-pressure metalorganic chemical vapor deposition on GaAs substrates. We demonstrate that the critical layer thickness corresponding to optimized single-QD layer structures (i.e., with reduced wetting layer thickness and high uniformity) can be controlled by kinetic effects. The optimized growth conditions allow us to grow six-layers stacked QD structures as active material for the fabrication of a light emitting devices operating around 1.3 μm at room temperature.