(111)-oriented barium titanate (BaTiO3) thick films were prepared on Pt-coated Si substrates by laser chemical vapor deposition. The effects of deposition temperature on the orientation, microstructure, and dielectric response of the BaTiO3 films were investigated. BaTiO3 films exhibited a significant (111) orientation at deposition temperatures from 930 to 1010K. With increasing deposition temperature from 875 to 1010K, the surface microstructure changed from cauliflower-like to columnar structures with pyramidal caps. The permittivity of a (111)-oriented tetragonal BaTiO3 film prepared at 980K was 1890 at room temperature and 2600 at the Curie temperature of the film (395K)

TiO₂ thin films were prepared on Pt/Ti/SiO₂/Si substrate by laser chemical vapor deposition (LCVD) method. The effects of laser power (P_L) and total pressure (p_tot) on the microstructure of TiO₂ thin films were investigated. The deposition temperature (T_dep) was mainly affected by P_L, increasing with P_L increasing. The single-phase rutile TiO₂ thin films with different morphologies were obtained. The morphologies of TiO₂ thin films were classified into three typical types, including the powdery, Wulff-shaped and granular microstructures. p_tot and T_dep were the two critical factors that could be effectively used for controlling the morphology of the films.