Umut T. Sanli

Dr. Umut T. Sanli

Max Planck Institute for Intelligent Systems

Research Focus & Metrics

Academic Career Length

9Years (2018-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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5 June 2018 in Advanced Science
Verified
Journal Article
Open access
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Umut T. SanliUmut T. Sanli
Umut T. Sanli
CJChengge Jiao
Chengge Jiao
MBMargarita Baluktsian
Margarita Baluktsian
CGCorinne Grévent
Corinne Grévent
KHKersten Hahn
Kersten Hahn
Kahraman KeskinboraKahraman Keskinbora
Kahraman Keskinbora
Focusing X‐rays to single nanometer dimensions is impeded by the lack of high‐quality, high‐resolution optics. Challenges in fabricating high aspect ratio 3D nanostructures limit the quality and the resolution. Multilayer zone plates target this challenge by offering virtually unlimited and freely selectable aspect ratios. Here, a full‐ceramic zone plate is fabricated via atomic layer deposition of multilayers over optical quality glass fibers and subsequent focused ion beam slicing. The quality of the multilayers is confirmed up to an aspect ratio of 500 with zones as thin as 25 nm. Focusing performance of the fabricated zone plate is tested toward the high‐energy limit of a soft X‐ray scanning transmission microscope, achieving a 15 nm half‐pitch cut‐off resolution. Sources of adverse influences are identified, and effective routes for improving the zone plate performance are elaborated, paving a clear path toward using multilayer zone plates in high‐energy X‐ray microscopy. Finally, a new fabrication concept is introduced for making zone plates with precisely tilted zones, targeting even higher resolutions.

24 February 2022 in Advanced Materials Technologies
Verified
Journal Article
Open access
Umut T. SanliUmut T. Sanli
Umut T. Sanli
TMTobias Messer
Tobias Messer
MWMarkus Weigand
Markus Weigand
LLLars Lötgering
Lars Lötgering
GSGisela Schütz
Gisela Schütz
KKKahraman Keskinbora
Kahraman Keskinbora
Efficient focusing of X‐rays is essential for high‐resolution X‐ray microscopy. Diffractive X‐ray optics called kinoforms offer the highest focusing efficiencies in theory. However, they have long remained unavailable due to their challenging nanofabrication. Recently, various X‐ray optic geometries including kinoforms have been realized using 3D laser lithography at near‐infrared wavelengths. As the smallest features (period) of the kinoform determines the resolving power, there is a natural drive to find ways to fabricate kinoforms with ever smaller features. Here, a custom‐built 3D laser lithography setup with an excitation wavelength of 405 nm is used, which allows to half the smallest period of the kinoforms compared to previous work. A 40% improvement in scanning transmission X‐ray microscopy image resolution, that is, a cutoff resolution of 145 nm, and an efficiency of 7.6% at 700 eV is achieved. A reconstructed pixel size of 18.5 nm, reaching the limit imposed by the design of the microscopy set‐up, is demonstrated through ptychographic imaging of a magnetic sample which has a strongly reduced contrast mechanism. Moreover, X‐ray lenses manufactured by 405 nm 3D laser lithography have the potential to become much less expensive than X‐ray lenses made by other means.