Hyo-Chang Lee is a research scientist at Korea Research Institute of Standards and Science (KRISS) and an adjunct professor of Hanyang University. He received a Ph.D. degree in electrical engineering (plasma science and technology) from Hanyang University, Seoul, Republic of Korea. Before joining KRISS, he was a lecture professor, research professor, and research fellow at Hanyang University (2012-2015), a visiting researcher at Princeton Plasma Physics Laboratory (2013), and a senior researcher at Etch Technology Team, Memory Division, Samsung Electronics (2015-2016). His research interests are experimental and theoretical studies of the industrial radio-frequency plasmas, development of the plasma diagnostic tools and the plasma sources, and plasma based nano/bio-applications. He is a senior member of IEEE. He has published over seventy SCI papers including Applied Physics Reviews.