Younghyun Kim

Prof. Younghyun Kim

Advanced Semiconductor Devices Laboratory, Hanyang University, Seoul 133-791, Korea
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Research Focus & Metrics

Academic Career Length

25Years (2002-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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28 May 2021 in Micromachines
Verified
Journal Article
Open access
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Younghyun KimYounghyun Kim
Younghyun Kim
JHJae-Hoon Han
Jae-Hoon Han
DADaehwan Ahn
Daehwan Ahn
SangHyeon KimSangHyeon Kim
SangHyeon Kim
The realization of a silicon optical phase shifter marked a cornerstone for the development of silicon photonics, and it is expected that optical interconnects based on the technology relax the explosive datacom growth in data centers. High-performance silicon optical modulators and switches, integrated into a chip, play a very important role in optical transceivers, encoding electrical signals onto the light at high speed and routing the optical signals, respectively. The development of the devices is continuously required to meet the ever-increasing data traffic at higher performance and lower cost. Therefore, heterogeneous integration is one of the highly promising approaches, expected to enable high modulation efficiency, low loss, low power consumption, small device footprint, etc. Therefore, we review heterogeneously integrated optical modulators and switches for the next-generation silicon photonic platform.

19 August 2024 in Nanoscale
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Journal Article
Open access
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TNTae Hyeon Noh
Tae Hyeon Noh
SCSimin Chen
Simin Chen
HKHyo-Bae Kim
Hyo-Bae Kim
TJTaewon Jin
Taewon Jin
SPSeoung Min Park
Seoung Min Park
Younghyun KimYounghyun Kim
Younghyun Kim
We successfully demonstrated a 2T0C-FeDRAM with a record-long multibit retention time exceeding 2000 seconds and 4-bit (19 states) capability, attributed to a VSN of 0 V leveraging the non-volatile properties of ferroelectrics.

10 April 2024 in ACS Applied Electronic Materials
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Journal Article
Closed access
XSXinkai Sun
Xinkai Sun
JHJae-Hoon Han
Jae-Hoon Han
ZXZhenyuan Xiao
Zhenyuan Xiao
SCSimin Chen
Simin Chen
TJTaewon Jin
Taewon Jin
Younghyun KimYounghyun Kim
Younghyun Kim

12 December 2022 in Nanoscale Advances
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Journal Article
Open access
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TJTaewon Jin
Taewon Jin
SangHyeon KimSangHyeon Kim
SangHyeon Kim
JHJae-Hoon Han
Jae-Hoon Han
DADae-Hwan Ahn
Dae-Hwan Ahn
SASeong Ui An
Seong Ui An
Younghyun KimYounghyun Kim
Younghyun Kim
We demonstrate the programmable light intensity of a micro-LED by compensating threshold voltage variability of thin-film transistors by introducing a non-volatile programmable ferroelectric material, HfZrO2 into the gate stack of the TFT.

5 June 2002 in Surface and Coatings Technology
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Journal Article
Closed access
RKRakhwan Kim
Rakhwan Kim
Younghyun KimYounghyun Kim
Younghyun Kim
YLYong-Uk Lee
Yong-Uk Lee
HKHee-Jae Kim
Hee-Jae Kim
JPJong-Wan Park
Jong-Wan Park

4 March 2015 in IEEE Journal of Quantum Electronics
Verified
Journal Article
Closed access
Younghyun KimYounghyun Kim
Younghyun Kim
MTMitsuru Takenaka
Mitsuru Takenaka
STShinichi Takagi
Shinichi Takagi
The modulation characteristics of carrier-depletion strained SiGe optical modulators with a vertical p-n junction are numerically analyzed by technology computer-aided design simulation and finite-difference optical mode analysis. In addition to the strong optical confinement in the vertical direction for the fundamental transverse electric field mode, the vertical p-n junction effectively depletes the strained SiGe layer in which the plasma dispersion effect is enhanced owing to the mass modulation of holes by strain. We predict that a Si 0.7 Ge 0.3 optical modulator exhibits V π L at 1.55 μm of as small as 0.31 V-cm at a bias voltage of -2 V, which is ~1.8 times smaller than that of a Si optical modulator. The product of V π L and the phase-shifter loss (αV π L) is also expected to be as low as 18.3 V-dB at -2 V, enabling optical modulation with a 5-dB extinction ratio in a symmetric Mach-Zehnder modulator.