In integrated photonics, specific wavelengths such as 1,550 nm are preferred due to low-loss transmission and the availability of optical gain in this spectral region. For chip-based photodetectors, two-dimensional materials bear scientifically and technologically relevant properties such as electrostatic tunability and strong light–matter interactions. However, no efficient photodetector in the telecommunication C-band has been realized with two-dimensional transition metal dichalcogenide materials due to their large optical bandgaps. Here we demonstrate a MoTe₂-based photodetector featuring a strong photoresponse (responsivity 0.5 A W^–1) operating at 1,550 nm in silicon photonics enabled by strain engineering the two-dimensional material. Non-planarized waveguide structures show a bandgap modulation of 0.2 eV, resulting in a large photoresponse in an otherwise photoinactive medium when unstrained. Unlike graphene-based photodetectors that rely on a gapless band structure, this photodetector shows an approximately 100-fold reduction in dark current, enabling an efficient noise-equivalent power of 90 pW Hz^–0.5. Such a strain-engineered integrated photodetector provides new opportunities for integrated optoelectronic systems.

Recently, integrated optics has become a functional platform for implementing machine learning algorithms and, in particular, neural networks. Photonic integrated circuits can straightforwardly perform vector-matrix multiplications with high efficiency and low power consumption by using weighting mechanism through linear optics. However, this cannot be said for the activation function, i.e., “threshold,” which requires either nonlinear optics or an electro-optic module with an appropriate dynamic range. Even though all-optical nonlinear optics is potentially faster, its current integration is challenging and is rather inefficient. Here, we demonstrate an electroabsorption modulator based on an indium tin oxide layer monolithically integrated into silicon photonic waveguides, whose dynamic range is used as a nonlinear activation function of a photonic neuron. The thresholding mechanism is based on a photodiode, which integrates the weighed products, and whose photovoltage drives the electroabsorption modulator. The synapse and neuron circuit is then constructed to execute a 200-node MNIST classification neural network used for benchmarking the nonlinear activation function and compared with an equivalent electronic module.

Photonic neural networks benefit from both the high-channel capacity and the wave nature of light acting as an effective weighting mechanism through linear optics. Incorporating a nonlinear activation function by using active integrated photonic components allows neural networks with multiple layers to be built monolithically, eliminating the need for energy and latency costs due to external conversion. Interferometer-based modulators, while popular in communications, have been shown to require more area than absorption-based modulators, resulting in a reduced neural network density. Here, we develop a model for absorption modulators in an electro-optic fully connected neural network, including noise, and compare the network’s performance with the activation functions produced intrinsically by five types of absorption modulators. Our results show the quantum well absorption modulator–based electro-optic neuron has the best performance allowing for 96% prediction accuracy with $1.7\times {10}^{-12}$ J/MAC excluding laser power when performing MNIST classification in a 2 hidden layer feed-forward photonic neural network.

Here we demonstrate a spectrally broadband, gigahertz-fast Mach–Zehnder interferometric modulator exhibiting a miniscule V π L of 95 V ⋅ µ m , deploying a subwavelength short electrostatically tunable plasmonic phase shifter based on heterogeneously integrated indium tin oxide thin films into silicon photonics.

Electro-optic modulators transform electronic signals into the optical domain and are critical components in modern telecommunication networks, RF photonics, and emerging applications in quantum photonics, neuromorphic photonics, and beam steering. All these applications require integrated and voltage-efficient modulator solutions with compact form factors that are seamlessly integrable with silicon photonics platforms and feature near-CMOS material processing synergies. However, existing integrated modulators are challenged to meet these requirements. Conversely, emerging electro-optic materials heterogeneously and monolithically integrated with Si photonics open up a new avenue for device engineering. Indium tin oxide (ITO) is one such compelling material for heterogeneous integration in Si exhibiting formidable electro-optic effect characterized by unity-order index change at telecommunication frequencies. Here we overcome these limitations and demonstrate a monolithically integrated ITO electro-optic modulator based on a Mach Zehnder interferometer featuring a high-performance half-wave voltage and active device length product of V_πL = 0.52 V mm. We show that the unity-strong index change enables a 30 μm-short π-phase shifter operating ITO in the index-dominated region away from the epsilon-near-zero point for reduced losses. This device experimentally confirms electrical phase shifting in ITO enabling its use in applications such as compact phase shifters, nonlinear activation functions in photonic neural networks, and phased array applications for LiDAR.

Densely integrated active photonics is key for next generation on-chip networks for addressing both footprint and energy budget concerns. However, the weak light-matter interaction in traditional active Silicon optoelectronics mandates rather sizable device lengths. The ideal active material choice should avail high index modulation while being easily integrated into Silicon photonics platforms. Indium tin oxide (ITO) offers such functionalities and has shown promising modulation capacity recently. Interestingly, the nanometer-thin unity-strong index modulation of ITO synergistically combines the high group-index in hybrid plasmonic with nanoscale optical modes. Following this design paradigm, here, we demonstrate a spectrally broadband, GHz-fast Mach–Zehnder interferometric modulator, exhibiting a high efficiency signified by a miniscule V_πL of 95 V μm, deploying a one-micrometer compact electrostatically tunable plasmonic phase-shifter, based on heterogeneously integrated ITO thin films into silicon photonics. Furthermore we show, that this device paradigm enables spectrally broadband operation across the entire telecommunication near infrared C-band. Such sub-wavelength short efficient and fast modulators monolithically integrated into Silicon platform open up new possibilities for high-density photonic circuitry, which is critical for high interconnect density of photonic neural networks or applications in GHz-fast optical phased-arrays, for example.