One-dimensional periodic surface structures were formed by femtosecond laser irradiation of amorphous hydrogenated silicon (a-Si:H) films. The a-Si:H laser processing conditions influence on the periodic relief formation as well as correlation of irradiated surfaces structural properties with their electrophysical properties were investigated. The surface structures with the period of 0.88 and 1.12 μm were fabricated at the laser wavelength of 1.25 μm and laser pulse number of 30 and 750, respectively. The orientation of the surface structure is defined by the laser polarization and depends on the concentration of nonequilibrium carriers excited by the femtosecond laser pulses in the near-surface region of the film, which affects a mode of the excited surface electromagnetic wave which is responsible for the periodic relief formation. Femtosecond laser irradiation increases the a-Si:H films conductivity by 3 to 4 orders of magnitude, up to 1.2 × 10⁻⁵ S∙cm, due to formation of Si nanocrystalline phase with the volume fraction from 17 to 28%. Dark conductivity and photoconductivity anisotropy, observed in the irradiated a-Si:H films is explained by a depolarizing effect inside periodic microscale relief, nonuniform crystalline Si phase distribution, as well as different carrier mobility and lifetime in plane of the studied samples along and perpendicular to the laser-induced periodic surface structures orientation, that was confirmed by the measured photoconductivity and absorption coefficient spectra.

Femtosecond laser-modified amorphous silicon (a-Si) films with optical and electrical anisotropy have perspective polarization-sensitive applications in optics, photovoltaics, and sensors. We demonstrate the formation of one-dimensional femtosecond laser-induced periodic surface structures (LIPSS) on the surface of phosphorus- (n-a-Si) and boron-doped (p-a-Si) amorphous silicon films. The LIPSS are orthogonal to the laser polarization, and their period decreases from 1.1 ± 0.1 µm to 0.84 ± 0.07 µm for p-a-Si and from 1.06 ± 0.03 to 0.98 ± 0.01 for n-a-Si when the number of laser pulses per unit area increases from 30 to 120. Raman spectra analysis indicates nonuniform nanocrystallization of the irradiated films, with the nanocrystalline Si phase volume fraction decreasing with depth from ~80 to ~40% for p-a-Si and from ~20 to ~10% for n-a-Si. LIPSS’ depolarizing effect, excessive ablation of the film between LIPSS ridges, as well as anisotropic crystalline phase distribution within the film lead to the emergence of conductivity anisotropy of up to 1 order for irradiated films. Current–voltage characteristic nonlinearity observed for modified p-a-Si samples may be associated with the presence of both the crystalline and amorphous phases, resulting in the formation of potential barriers for the in-plane carrier transport and Schottky barriers at the electric contacts.