Using micro-Raman spectroscopy, we have studied the vibrational properties of GaN and ${\mathrm{Al}}_{\text{0.5}}{\mathrm{Ga}}_{\text{0.5}}\mathrm{N/GaN}$ long period superlattices (SLs) grown on Si(111). Crack-free areas of GaN layers grown on Si(111) exhibit residual tensile stress, which is evidenced by the red shift of the frequency of $E_2(\mathrm{TO})$ phonon. We have derived the strain cartography in GaN and ${\mathrm{Al}}_{\text{0.5}}{\mathrm{Ga}}_{\text{0.5}}\mathrm{N/GaN}$ long period SLs, which shows that cracking leads to strain relaxation. In addition, the AlGaN layers on GaN introduce an additional component of compressive strain into the GaN layers in these SLs. The amount of strain is quantified using micro-Raman analyses and by taking into account the elastic properties of GaN and AlGaN. By introducing a thin, low temperature InGaN interlayer, we could significantly reduce the crack density of the GaN layer.

A novel scheme of pre-surface modification of media using mixed argon-nitrogen plasma is proposed to improve the protection performance of 1.5 nm carbon overcoats (COC) on media produced by a facile pulsed DC sputtering technique. We observe stable and lower friction, higher wear resistance, higher oxidation resistance, and lower surface polarity for the media sample modified in 70%Ar + 30%N₂ plasma and possessing 1.5 nm COC as compared to samples prepared using gaseous compositions of 100%Ar and 50%Ar + 50%N₂ with 1.5 nm COC. Raman and X-ray photoelectron spectroscopy results suggest that the surface modification process does not affect the microstructure of the grown COC. Instead, the improved tribological, corrosion-resistant and oxidation-resistant characteristics after 70%Ar + 30%N₂ plasma-assisted modification can be attributed to, firstly, the enrichment in surface and interfacial bonding, leading to interfacial strength, and secondly, more effective removal of ambient oxygen from the media surface, leading to stronger adhesion of the COC with media, reduction of media corrosion and oxidation, and surface polarity. Moreover, the tribological, corrosion and surface properties of mixed Ar + N₂ plasma treated media with 1.5 nm COCs are found to be comparable or better than ~2.7 nm thick conventional COC in commercial media.

Micro-light emitting diode (LED) arrays with diameters of 4 to 20 μm have been fabricated and were found to be much more efficient light emitters compared to their broad-area counterparts, with up to five times enhancement in optical power densities. The possible mechanisms responsible for the improvement in performance were investigated. Strain relaxation in the microstructures as measured by Raman spectroscopy was not observed, arguing against theories of an increase in internal quantum efficiency due to a reduction of the piezoelectric field put forward by other groups. Optical microscope images show intense light emission at the periphery of the devices, as a result of light scattering off the etched sidewalls. This increases the extraction efficiency relative to broad area devices and boosts the forward optical output. In addition, spectra of the forward emitted light reveal the presence of resonant cavity modes [whispering gallery (WG) modes in particular] which appear to play a role in enhancing the optical output.

The deep levels in GaN associated with yellow luminescence transitions have been investigated using photoluminescence, Hall measurements, and deep level transient spectroscopy (DLTS). Hall measurements on Si-doped GaN show the presence of donor levels at ∼18, ∼35, and ∼70 meV, which are respectively associated with the Si shallow donors, O impurities, and the nitrogen vacancies (VN). DLTS measurements, on the other hand, reveal trap levels at Ec−0.1 eV, Ec−(0.2–0.24) eV, and Ev+0.87 eV. The trap level at Ec−0.1 eV obtained from DLTS can be correlated to the 70 meV deep donor (VN) obtained from Hall measurements. The deep donor band at Ec−(0.2–0.24) eV is attributed to the ON related defect complex decorated along dislocation sites while the hole level at Ev+0.87 eV is attributed to the Ga vacancy (VGa). Thermal annealing at 750 °C in nitrogen ambient results in reduction of yellow luminescence, which could be due to decrease in the concentration of VN and ON-related defect complexes. From these observations, we propose that yellow luminescence in GaN arises from the transitions from the Ec−(0.2–0.24) eV levels to the deep level at Ev+0.87 eV.