Sharnali Islam

Dr. Sharnali Islam

orcid

Research Focus & Metrics

Academic Career Length

8Years (2019-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

View All Publications
10 September 2019 in IEEE Transactions on Circuits and Systems II: Express Briefs
Verified
Journal Article
Closed access
MHMehedi Hasan
Mehedi Hasan
JHJobayer Hossein
Jobayer Hossein
MHMainul Hossain
Mainul Hossain
HZHasan U. Zaman
Hasan U. Zaman
SISharnali Islam
Sharnali Islam
A novel design of a hybrid Full Adder (FA) using Pass Transistors (PTs), Transmission Gates (TGs) and Conventional Complementary Metal Oxide Semiconductor (CCMOS) logic is presented. Performance analysis of the circuit has been conducted using Cadence toolset. For comparative analysis, the performance parameters have been compared with twenty existing FA circuits. The proposed FA has also been extended up to a word length of 64 bits in order to test its scalability. Only the proposed FA and five of the existing designs have the ability to operate without utilizing buffer in intermediate stages while extended to 64 bits. According to simulation results, the proposed design demonstrates notable performance in power consumption and delay which accounted for low power delay product. Based on the simulation results, it can be stated that the proposed hybrid FA circuit is an attractive alternative in the data path design of modern high-speed Central Processing Units.

11 June 2021 in The Journal of Physical Chemistry C
Verified
Journal Article
Closed access
SNSadiq Shahriyar Nishat
Sadiq Shahriyar Nishat
JHJayed Hossain
Jayed Hossain
FMFaiyaz Elahi Mullick
Faiyaz Elahi Mullick
AKAlamgir Kabir
Alamgir Kabir
SCShaestagir Chowdhury
Shaestagir Chowdhury
MHMainul Hossain
Mainul Hossain

22 June 2023 in RSC Advances
Verified
Journal Article
Open access
PDF file
MMMd. Mashrafi
Md. Mashrafi
MAM. Hussayeen Khan Anik
M. Hussayeen Khan Anik
MIMst. Farhana Israt
Mst. Farhana Israt
AHAhsan Habib
Ahsan Habib
SISharnali Islam
Sharnali Islam
Mixed organic–inorganic halide perovskite solar cells (PSCs) are a promising technology with increasing power conversion efficiency (PCE), low-cost material constituents, simple scalability, and a low-temperature solution fabrication process. Recent developments have seen energy conversion efficiencies increase from 3.8% to over 20%. However, to further improve PCE and reach the target efficiency of over 30%, light absorption through plasmonic nanostructures is a promising approach. In this work, we present a thorough quantitative analysis of the absorption spectrum of a methylammonium lead iodide (CH3NH3PbI3) perovskite solar cell using a nanoparticle (NP) array. Our multiphysics simulations using finite element methods (FEM) show that an array of Au nanospheres can increase average absorption >45%, compared to only 27.08% for the baseline structure without any NPs. Furthermore, we investigate the combined effect of engineered enhanced absorption on electrical and optical solar cell performance parameters using the one-dimensional solar cell capacitance software (SCAPS 1-D), which shows a PCE of ∼30.4%, significantly higher than the PCE of ∼21% for cells without NPs. Our findings demonstrate the potential of plasmonic perovskite research for next-generation optoelectronic technologies.

1 March 2021 in Microelectronics Journal
Verified
Journal Article
Closed access
MHMehedi Hasan
Mehedi Hasan
MHMuhammad Saddam Hossain
Muhammad Saddam Hossain
ASAbdul Hasib Siddique
Abdul Hasib Siddique
MHMainul Hossain
Mainul Hossain
HZHasan U. Zaman
Hasan U. Zaman
SISharnali Islam
Sharnali Islam


23 December 2019 in Semiconductor Science and Technology
Verified
Journal Article
Closed access
PDF file
FSFahimul Islam Sakib
Fahimul Islam Sakib
FMFaiyaz Elahi Mullick
Faiyaz Elahi Mullick
SSShafat Shahnewaz
Shafat Shahnewaz
SISharnali Islam
Sharnali Islam
MHMainul Hossain
Mainul Hossain
We report a comparative analysis of the performance of negative capacitance field-effect transistors (NCFETs) with single gate, double gate, tri-gate (FinFET) and gate-all-around (GAA) device architectures, using TCAD simulations. Metal-ferroelectric-metal-insulator-semiconductor (MFMIS) structure is chosen for all NCFET devices. The NC behavior is attributed to the ferroelectric (FE) layer introduced into the gate stack of these devices. With aluminum doped hafnium oxide as the FE, electrical characteristics of NCFETs, with 40 nm or equivalent gate length, were simulated by solving a combination of Landau-Khalatnikov (LK) equation and metal oxide semiconductor field-effect transistor (MOSFET) equations. At a drain voltage, V D = 50 mV, NC-FinFET and NC-GAAFET achieve 45% and 67.5% reduction in sub-threshold swing ( SS ), respectively, compared to baseline devices, without any NC effect. In addition to improving sub-threshold performance, NCFETs have also shown higher I ON / I OFF ratio than baseline devices for all device architectures. By tuning the thickness of the FE material, we have demonstrated capacitance matching, between FE and MOS capacitances, for non-hysteretic operation in NC-FinFET and NC-GAAFET. Matching FE and MOS capacitances allow for maximum NC effect. Results obtained from our TCAD simulations are consistent with reported experimental data and could provide useful insights into the design, operation and performance improvement of next generation NCFET devices.