This paper aims to analyze the mechanism of power absorption and to reveal, both experimentally and numerically, the basic factors determining the ability of plasma to absorb RF power. This is done by determining the plasma equivalent resistance value under different conditions in a low-pressure RF inductive discharge such as different antenna shape, working gas pressure, electron density, operating frequency and geometrical dimensions of the plasma source. Experimental and numerical results show that the plasma equivalent resistance changes non-monotonously with an increase in electron density, increases with an increase in neutral gas pressure, and that the maximum plasma equivalent resistance shifts toward higher electron densities when the operating frequency is increased.

Present paper is aimed to reveal experimentally and theoretically the influence of magnetic field strength, antenna shape, pressure, operating frequency and geometrical size of plasma sources on the ability of plasma to absorb the RF power characterized by the equivalent plasma resistance for the case of low pressure RF inductive discharge located in the external magnetic field. The distinguishing feature of the present paper is the consideration of the antennas that generate not only current but charge on the external surface of plasma sources. It is shown that in the limited plasma source two linked waves can be excited. In case of antennas generating only azimuthal current the waves can be attributed as helicon and TG waves. In the case of an antenna with the longitudinal current there is a surface charge on the side surface of the plasma source, which gives rise to a significant increase of the longitudinal and radial components of the RF electric field as compared with the case of the azimuthal antenna current.

The present paper deals with the experimental and numerical study of radio-frequency (RF) low-pressure discharge having both inductive and capacitive or DC channels. Two discharge schemes are considered. In the first case the inductive and capacitive channels are powered by two independent RF power sources. In the second case the inductor and capacitor plates, being the main parts of inductive and capacitive channels, are connected in parallel to one RF power source. The properties of the mentioned discharges are compared with that of pure inductive RF discharge. It is shown that the presence of the capacitive component leads to changes of the fraction of RF power coupled through the inductive channel. This manifests with a reduction of the RF source power value, at which the transition from E- to H-mode takes place, and with the disappearance of hysteresis.

This work is devoted to systematic investigation into the radial dependence of the plasma parameters of a low-pressure inductive radio-frequency (RF) discharge on pressure within a wide range of 0.8–1 Torr. Experimental results that were obtained under the considered pressures make it possible to analyze the patterns of the changes in plasma parameters upon both a nonlocal mode of discharge and a transition from a nonlocal to local mode of the RF power input. Discharges in helium, neon, argon, and krypton were considered. Experimental data were compared to the results of the numerical simulation of the inductive RF discharge using the particle-in-cell (PIC) method.

The results of the study of the plasma hybrid system based on the combined magnetron discharge and high-frequency inductive discharge located in the external magnetic field is presented. Magnetron discharge provides the generation of atoms and ions of the target materials while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge. An external magnetic field is used to optimize the power input to the discharge, to increase the ion current density in the realm of substrate and to enhance the area of uniform plasma. The joint operation of magnetron and RF inductive discharge leads to a substantial increase (not equal to the sum of the parameters obtained under separate operation of two hybrid system channels) of the ion current density and intensity of sputtered material spectral lines radiation. Optimal mode of the hybrid plasma system operation provides uniform ion current density on the diameter of at least 150mm at 0.7PA argon pressure. The optimal values of the magnetic fields in the region of the substrate location lie in the range 2-8 mTl, while in the region of the RF input power unit lie in the range 0.5-25 mTl.