TaNx coatings were deposited by RF magnetron sputtering with different bias voltages. The growth morphology, crystalline structure, chemical bond structure, hardness and elastic modulus, adhesion strength and tribological performance of the coatings were studied as a function of the bias voltage. The results showed that an increasing bias voltage refines the coating grains and facilitates structure densification. Simultaneously, the structure of the TaNx coatings transfers from a composite structure consisting of TaN and Ta2N crystals, through a single composite mainly composed of the Ta2N crystal, to an amorphous structure as the bias voltage increases from low to high, indicating that the phase composition of the TaNx coatings can be varied by the bias voltage. The coating composed of Ta2N crystal showed a good overall performance including enhanced hardness, enhanced adhesive strength, and good tribological performance with enhanced wear resistance and a low friction coefficient of 0.18.
In this paper, diamond-like carbon (DLC) coatings with Si and O co-doping (Si/O-DLC) were deposited by reactive magnetron sputtering using a gas mixture of C2H2, O2 and Ar to sputter a silicon/graphite splicing target. The O content in the Si/O-DLC coatings was controlled by tuning the O2 flux in the gas mixture. The composition, chemical bond structure, mechanical properties and tribological behavior of the coatings were investigated by X-ray photoelectron spectroscopy, Fourier infrared spectrometer, Raman spectroscopy, nanoindentation, a scratch tester and a ball-on-disk tribometer. The electrical resistivity of the Si/O-DLC coatings was also studied using the four-point probe method. The results show that the doping O tends to bond with Si to form a silicon–oxygen compound, causing a decrease in the sp3 content as well as the hardness of the coatings. The tribological performance of the coatings can be improved due to the formation of the silicon–oxygen compound, which can effectively reduce the friction coefficient. In addition, the insulating silicon–oxygen compound is doped into the C-C network structure, significantly improving the surface resistivity of the DLC coating with a low sp3 content. The Si/O-DLC coatings with good mechanical properties, tribological performance and electrical insulation properties might be used as protection and insulation layers for microelectronics.
ZrNx films were deposited by DC magnetron sputtering with pure Zr target in different nitrogen partial pressure atmospheres ( ). The structure and composition of the thin films were characterized as a function of using scanning electron microscope, glancing angle X-ray diffraction, and X-ray photoelectron spectroscopy. The hardness, adhesive strength, and corrosion behavior of the coatings were measured by nanoindentation, microscratch, and potentiodynamic measurements in 3.5 wt% NaCl solution. The results show that the structure of the ZrNx films changes from a nearly stoichiometric ZrN with a typical columnar structure to mixed phases composited of ZrN and α-ZrNx with a dense glass structure as increases from 12% to 50%. The mechanical properties including hardness, elastic modulus, and adhesion decrease with increasing due to nonstoichiometric compound and glass phase structure of the coatings, while the dense glass structure significantly improves the corrosion inhibition.
A MoNx coating serves as an effective wear protection layer and is crucial for the investigation of its tribological characteristics at various temperatures. This study examined the tribological characteristics of MoNx coatings that were deposited through high-power pulsed magnetron sputtering (HiPIMS) in an Ar/N2 environment with varying N2 partial pressures. The microstructures and mechanical properties of the coatings were elucidated using scanning electron microscopy, grazing-incidence-angle X-ray diffraction, energy-dispersive spectroscopy, and nanoindentation. The dry friction performances of the coatings at different heating temperatures were studied using a ball-on-disk tribometer. The MoNx coating produced by HiPIMS was composed primarily of fcc−Mo2N and featured a fine, dense column crystal with a maximum hardness of 28.8 GPa. The MoNx coatings exhibited excellent lubrication and wear reduction properties at room temperature (RT). The dry friction performances of the MoNx coatings at elevated temperatures were expected to depend on the growth of the MoO3 tribolayer. At relatively low temperatures (300 °C and 400 °C), the MoO3 tribolayer grew slowly and was not enough to provide good lubrication, causing increases in the dry friction of the coatings. However, the δ−MoN phase formed in the MoNx coating deposited at a high N2 partial pressure could facilitate the formation of MoO3 and thus decreased the friction coefficient at 400 °C. At the relatively high heating temperature of 500 °C, however, the MoO3 tribolayer grew so rapidly that the oxide layer became thick, resulting in an increase in the wear rate. It is believed that tuning the growth rate of MoO3 via optimizing the composition and structure of the MoNx coatings might be a useful way to improve the dry friction at various elevated temperatures.
17 July 2025 in Journal of Materials Research and Technology