Fu-Hsiang Ko

Dr. Fu-Hsiang Ko

Department of Materials Science and Engineering, National Yang Ming Chiao Tung University, Hsinchu 300, Taiwan

Research Focus & Metrics

Academic Career Length

23Years (2004-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

View All Publications
12 August 2013 in Journal of Materials Chemistry C
Verified
Journal Article
Closed access
PDF file
JMJagan Singh Meena
Jagan Singh Meena
MCMin-Ching Chu
Min-Ching Chu
YCYu-Cheng Chang
Yu-Cheng Chang
HYHsin-Chiang You
Hsin-Chiang You
RSRanjodh Singh
Ranjodh Singh
Fu-Hsiang KoFu-Hsiang Ko
Fu-Hsiang Ko
Electronic displays and flexible electronics are poised to significantly impact emerging industries, including displays, energy products, sensors and medical devices, building a market that will significantly grow in the future. The implementation of transparent electronic devices requires the use of material components that could be formed using controlled deposition in the appropriate orientation onto a transparent flexible substrate. Here, we report a simple and efficient means of depositing onto a flexible polyimide (PI) substrate a highly ordered and highly aligned zinc oxide (ZnO) film for use as a carrier transporting and semiconducting layer with controlled surface charge density for thin-film transistor (TFT) applications. The deposition approach is based on the solution-coating of a zinc-acetate suspension under controlled conditions of the spread flow rate, droplet size of the drops, speed limit, and the oxygen (ca. O2) plasma treatment of the coated film surface on the PI substrate. The plasma surface interactions on the surface states of the ZnO films for various times (ca. 1–5 min) were studied using X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy. Moreover, the effects of O2 plasma and the subsequent thermal annealing in an O2 atmosphere at 250 °C on the properties of ZnO films were studied for its efficacy in TFT applications in terms of the charge carrier density and the change in the mobility. ZnO thin-film-based TFTs on PI exhibited a very high electron mobility of 22.8 cm2 V−1 s−1 at a drain bias of 5 V after treatment with O2 plasma for 2 min. Furthermore, the plasma treatment for long durations of time caused a reduction in the charge carrier density from 1.58 × 1019 cm−3 for the 2 min treatment to 1.13 × 1017 cm−3 for the 5 min treatment, and the corresponding electron mobility was changed from 22.8 and 3.1 cm2 V−1 s−1 for the treatment times of 2 min and 5 min, respectively. The spin-coating technique used to deposit very thin ZnO films is currently used in microelectronics technology, which helps to ensure that the described ZnO thin-film deposition approach can be implemented in production lines with minimal changes in the fabrication design and in the auxiliary tools used in flexible electronics production.

17 September 2008 in Chemical Communications
Verified
Journal Article
Closed access
PDF file
CWChung-Shu Wu
Chung-Shu Wu
CWChia-Tien Wu
Chia-Tien Wu
YYYuh-Shyong Yang
Yuh-Shyong Yang
Fu-Hsiang KoFu-Hsiang Ko
Fu-Hsiang Ko
Kinetic and thermodynamic studies reveal that the property of significantly enhanced catalytic activity with colloidal stability is attributed to an efficacious means of tuning enzyme–substrate association by varying with the rate constants in the presence of functionalized gold nanoparticles.

1 January 2006 in Journal of the Electrochemical Society
Verified
Journal Article
Closed access
PDF file
THTzu-Hsiang Hsu
Tzu-Hsiang Hsu
HYHsin-Chiang You
Hsin-Chiang You
Fu-Hsiang KoFu-Hsiang Ko
Fu-Hsiang Ko
TLTan-Fu Lei
Tan-Fu Lei
In this paper, we propose a method for depositing the charge trapping layer of a high- <mml:math display="inline"><mml:mrow><mml:mi>k</mml:mi></mml:mrow></mml:math>k <mml:math display="inline"><mml:mrow><mml:mi>polySi</mml:mi><mml:mtext>-</mml:mtext><mml:msub><mml:mi>SiO</mml:mi><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub><mml:mtext>-</mml:mtext><mml:msub><mml:mi>ZrO</mml:mi><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub><mml:mtext>-</mml:mtext><mml:msub><mml:mi>SiO</mml:mi><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub><mml:mtext>-</mml:mtext><mml:mi>Si</mml:mi></mml:mrow></mml:math>polySi-SiO2-ZrO2-SiO2-Si (SOZOS) memory device. In this approach, the trapping layer was formed through simple two steps: (i) spin-coating of the <mml:math display="inline"><mml:mrow><mml:msub><mml:mi>ZrCl</mml:mi><mml:mrow><mml:mn>4</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>ZrCl4 precursor and (ii) rapid thermal annealing for <mml:math display="inline"><mml:mrow><mml:mn>1</mml:mn><mml:mspace width="0.3em"></mml:mspace><mml:mi>min</mml:mi></mml:mrow></mml:math>1min at <mml:math display="inline"><mml:mrow><mml:mn>900</mml:mn><mml:mo>°</mml:mo><mml:mi mathvariant="normal">C</mml:mi></mml:mrow></mml:math>900°C under an oxygen atmosphere. The morphology of the <mml:math display="inline"><mml:mrow><mml:msub><mml:mi>ZrO</mml:mi><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>ZrO2 charge trapping layer was confirmed through X-ray photoemission spectroscopy analysis. The sol-gel-derived layer exhibited improved charge trapping in the SOZOS memory device, resulting in a threshold voltage shift of <mml:math display="inline"><mml:mrow><mml:mn>2.7</mml:mn><mml:mspace width="0.3em"></mml:mspace><mml:mi mathvariant="normal">V</mml:mi></mml:mrow></mml:math>2.7V in the <mml:math display="inline"><mml:mrow><mml:msub><mml:mi>I</mml:mi><mml:mi>d</mml:mi></mml:msub><mml:mtext>-</mml:mtext><mml:msub><mml:mi>V</mml:mi><mml:mi>g</mml:mi></mml:msub></mml:mrow></mml:math>Id-Vg curve, <mml:math display="inline"><mml:mrow><mml:mi mathvariant="normal">P</mml:mi><mml:mo>∕</mml:mo><mml:mi mathvariant="normal">E</mml:mi></mml:mrow></mml:math>P∕E (program/erase) speeds as fast as <mml:math display="inline"><mml:mrow><mml:mn>0.1</mml:mn><mml:mspace width="0.3em"></mml:mspace><mml:mi mathvariant="normal">ms</mml:mi></mml:mrow></mml:math>0.1ms , good data retention up to <mml:math display="inline"><mml:mrow><mml:msup><mml:mrow><mml:mn>10</mml:mn></mml:mrow><mml:mrow><mml:mn>4</mml:mn></mml:mrow></mml:msup><mml:mspace width="0.3em"></mml:mspace><mml:mi mathvariant="normal">s</mml:mi></mml:mrow></mml:math>104s (only a 5% charge loss due to deep trapping in the <mml:math display="inline"><mml:mrow><mml:msub><mml:mi>ZrO</mml:mi><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>ZrO2 layer), and good endurance (no memory window narrowing after <mml:math display="inline"><mml:mrow><mml:msup><mml:mrow><mml:mn>10</mml:mn></mml:mrow><mml:mrow><mml:mn>5</mml:mn></mml:mrow></mml:msup></mml:mrow></mml:math>105 <mml:math display="inline"><mml:mrow><mml:mi mathvariant="normal">P</mml:mi><mml:mo>∕</mml:mo><mml:mi mathvariant="normal">E</mml:mi></mml:mrow></mml:math>P∕E cycles).

20 May 2011 in Chemical Communications
Verified
Journal Article
Closed access
PDF file
CWChung-Shu Wu
Chung-Shu Wu
CLCheng-Che Lee
Cheng-Che Lee
CWChia-Tien Wu
Chia-Tien Wu
YYYuh-Shyong Yang
Yuh-Shyong Yang
Fu-Hsiang KoFu-Hsiang Ko
Fu-Hsiang Ko
A series of experiments were performed to systematically analyze the effect of nanoparticle (NP) size on the catalytic behavior of enzyme–NP conjugates, and a shielding model based on diffusion–collision theory was developed to explain the correlation between the size effects and the kinetic responses.

19 August 2010 in Analytical and Bioanalytical Chemistry
Verified
Journal Article
Closed access
PDF file
CWChung-Shu Wu
Chung-Shu Wu
FLFu-Ken Liu
Fu-Ken Liu
Fu-Hsiang KoFu-Hsiang Ko
Fu-Hsiang Ko

27 April 2016 in New Journal of Chemistry
Verified
Journal Article
Closed access
PDF file
TSTuribius Simon
Turibius Simon
Muthaiah ShellaiahMuthaiah Shellaiah
Muthaiah Shellaiah
SVSrinivasadesikan Venkatesan
Srinivasadesikan Venkatesan
CLChing-Chang Lin
Ching-Chang Lin
Fu-Hsiang KoFu-Hsiang Ko
Fu-Hsiang Ko
MLMing-Chang Lin
Ming-Chang Lin
A simple anthracene-based AP probe was synthesized to detect Cu2+ ions, via the photoinduced electron transfer mechanism, in live cells.