A simple doser for atomic hydrogen is described. It basically consists of a tungsten capillary which on the outlet is heated by electron bombardment to 1800–2000 K. This temperature is sufficient to achieve nearly total H2 dissociation under relevant working pressures. The performance of the atomic hydrogen source was tested by H adsorption studies on Cu(110). The saturation coverage on this surface could be achieved with a nominal exposure which was smaller by a factor of ∼10−3 as compared to conventional methods of dissociation on a hot filament. The higher efficiency of the present H source greatly reduces the risk of sample contamination.

A direct electronic recombination process is observed following $3p$ excitation in both Ti and Ti${\mathrm{O}}_2$. In Ti this leads to resonant photoemission from the $3d$ valence levels at a photon energy 14 eV above the $3p$ threshold. In Ti${\mathrm{O}}_2$ the oxide valence-band emission is enhanced at the $3p$ resonance energy. This is the first observation of interatomic resonant photoemission in an oxide. The resonant electron emission is also observed in electronically excited Auger spectra.