An arrangement of self-assembled GaN nanowires (NWs) grown by plasma-assisted molecular beam epitaxy on a Si(111) substrate is studied as a function of the temperature at which the substrate is nitridized before GaN growth. We show that the NWs grow with the c-axis perpendicular to the substrate surface independently of nitridation temperature with only a slight improvement in tilt coherency for high nitridation temperatures. A much larger influence of the substrate nitridation process on the in-plane arrangement of NWs is found. For high (850 °C) and medium (450 °C) nitridation temperatures angular twist distributions are relatively narrow and NWs are epitaxially aligned to the substrate in the same way as commonly observed in GaN on Si(111) planar layers with an AlN buffer. However, if the substrate is nitridized at low temperature (~150 °C) the epitaxial relationship with the substrate is lost and an almost random in-plane orientation of GaN NWs is observed. These results are correlated with a microstructure of silicon nitride film created on the substrate as the result of the nitridation procedure.

Using strain analysis on high resolution electron microscopy images and finite element modeling of InGaN quantum wells (QWs), it is shown that the In composition changes inside the layers can be accurately determined. The analyzed samples were nominally grown with 15%–17% In composition by molecular beam or metalorganic vapor phase epitaxy. Inside these QWs, the In composition is not homogeneous. Finite element modeling strongly suggests that the measured strain corresponds most probably to InN clusters whose size depends on the growth method.

Monolayer transition metal dichalcogenides (TMDs) manifest exceptional optical properties related to narrow excitonic resonances. However, these properties have been so far explored only for structures produced by techniques inducing considerable large-scale inhomogeneity. In contrast, techniques which are essentially free from this disadvantage, such as molecular beam epitaxy (MBE), have to date yielded only structures characterized by considerable spectral broadening, which hinders most of interesting optical effects. Here we report for the first time on the MBE-grown TMD exhibiting narrow and resolved spectral lines of neutral and charged exciton. Moreover, our material exhibits unprecedented high homogeneity of optical properties, with variation of the exciton energy as small as 0.16 meV over a distance of tens of micrometers. Our recipe for MBE growth is presented for MoSe₂ and includes the use of atomically flat hexagonal boron nitride (hBN) substrate. This recipe opens a possibility of producing TMD heterostructures with optical quality, dimensions and homogeneity required for optoelectronic applications.

ZnTe nanowires with an average diameter of about $30\mathrm{nm}$ and lengths above $1\mu \mathrm{m}$ were grown on GaAs(100) substrate by molecular beam epitaxy. The growth process was based on the Au-catalyzed vapor-liquid-solid mechanism. A thin gold layer ($3–20\mathrm{\AA }$ thick) annealed in high vacuum prior to the nanowire growth was used as a source of catalytic nanoparticles. The nanowires are inclined about 55° to the (100) substrate surface normal. They have a zinc-blende crystal structure and their growth axis is ⟨111⟩.