In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily. Different types of temperature sensors, biosensors, photosensors, etc., have been developed to meet the necessities of people. All these devices have chips inside them fabricated using diodes, transistors, logic gates, and ICs. The patterning of the substrate which is used for the further development of these devices is done with the help of a technique known as lithography. In the present work, we have carried out a review on different types of lithographic techniques such as optical lithography, extreme ultraviolet lithography, electron beam lithography, X-ray lithography, and ion beam lithography. The evolution of these techniques with time and their application in device fabrication are discussed. The different exposure tools developed in the past decade to enhance the resolution of these devices are also discussed. Chemically amplified and non-chemically amplified resists with their bonding and thickness are discussed. Mask and maskless lithography techniques are discussed along with their merits and demerits. Device fabrication at micro and nano scale has been discussed. Advancements that can be made to improve the performance of these techniques are also suggested.

Green synthesis of ultra-small ZnO nanoparticles (5.2/12.41 nm) using Justicia adhatoda leaf extract. Exceptional photocatalytic degradation of malachite green (99.8%) and reduction of 4-nitrophenol under UV/sunlight. Eco-friendly water remediation.

The photocatalytic activity of eco-friendly zinc oxide doped silica nanocomposites, synthesized via a co-precipitation method followed by heat-treatment at 300, 600, and 900 °C is investigated. The samples have been characterized by employing X-ray diffraction method, and further analyzed using the Rietveld Refinement method. The samples show a space group P63mc with hexagonal structure. The prepared composites are tested for their photocatalytic activities for the degradation of methyl orange-based water pollutants under ultra-violet (UV) irradiation using a 125 W mercury lamp. A systematic analysis of parameters such as the irradiation time, pH value, annealing temperatures, and the concentration of sodium hydroxide impacting the degradation of the methyl orange (MO) is carried out using UV-visible spectroscopy. The ZnO.SiO₂ nanocomposite annealed at 300 °C at a pH value of seven shows a maximum photo-degradation ability (~98.1%) towards methyl orange, while the photo-degradation ability of ZnO.SiO₂ nanocomposites decreases with annealing temperature (i.e., for 600 and 900 °C) due to the aspect ratio. Moreover, it is seen that with increment in the concentration of the NaOH (i.e., from 1 to 3 g), the photo-degradation of the dye component is enhanced from 20.9 to 53.8%, whereas a reverse trend of degradation ability is observed for higher concentrations.