This article summarizes the current development status of nanoimprint lithography (NIL) technology and its application prospects in multiple industries. Nanoimprint lithography technology has significant advantages, such as low cost, high resolution, and no development, and is not affected by standing wave effects, making it a potential technology in industries such as semiconductors, photovoltaics, and LEDs. However, nanoimprint lithography technology still faces challenges in terms of film characteristics and material selection during application. This article analyzes existing research and discusses its application advantages in the fields of patterned sapphire substrates (PSSs), Light-Emitting Diode (LED) chips, photovoltaic cells, etc., and proposes the role of technological progress in promoting industrialization. This article summarizes the opportunities and challenges of nanoimprint lithography technology in the future industrialization process and anticipates its development prospects for large-scale production.

Abrasive belt grinding is the key technology in high-end precision manufacturing field, but the working condition of abrasive particles on the surface of the belt will directly affect the quality and efficiency during processing. Aiming at the problem of the inability to monitor the wearing status of abrasive belt in real-time during the grinding process, and the challenge of time-consuming control while shutdown for detection, this paper proposes a method for predicating the wear of abrasive belt while the grinding process based on back-propagation (BP) neural network. First, experiments are carried out based on ultra-depth-of-field detection technology, and different parameter combinations are used to measure the degree of abrasive belt wear. Then the effects of different grinding speeds, different contact pressures, and different work piece materials on the abrasive belt wear rate are obtained. It can be concluded that the abrasive belt wear rate gradually increases as the grinding speed of the abrasive belt increases. With the increase of steel grade, the hardness of the steel structure increases, which intensifies the abrasive belt wear. As the contact pressure increases, the pressure on a single abrasive particle increases, which ultimately leads to increased wear. With the increase of contact pressure, the increase of the wear rate of materials with higher hardness is greater. By utilizing the artificial intelligence BP neural network method, 18 sets of experiment data are used for training BP neural network while 9 sets of data are used for verification, and the nonlinear mapping relationship between various process parameter combinations such as grinding speed, contact pressure, workpiece material, and wear rate is established to predict the wear degree of abrasive belt. Finally, the results of verification by examples show that the method proposed in this paper can fulfill the purpose of quickly and accurately predicting the degree of abrasive belt wear, which can be used for guiding the manufacturing processing, and greatly improving the processing efficiency.

This article proposes a novel transparent conductive film structure to solve the problem of electrostatic accumulation in traditional nanoimprint lithography processes. This structure is formed by spin-coating a layer of silver nanowire (AgNWs) transparent conductive films on a graphic substrate, followed by coating a layer of polydimethylsiloxane (PDMS) on the surface of the film. After the PDMS is cured, it is peeled off from the substrate to form a free-standing elastic three-dimensional structured surface. These transparent conductive films are not only designed to mitigate static electricity generated during the nanoimprint lithography process, but also have excellent UV transparency, with a 325 nm UV transmittance of up to 90%. At the same time, it exhibits good conductivity with a sheet resistance of 20 Ω/sq. In addition, the films have excellent elasticity and can maintain stable conductivity during repeated stretching, providing a novel solution for flexible optoelectronic devices and nanoimprint technology.

Nanoimprint lithography (NIL) is highly dependent on imprinted film as a pattern-transfer medium. This paper systematically reviews the research progress of imprint film materials for NIL. Firstly, polydimethylsiloxane (PDMS), polyethylene terephthalate (PET), polyvinyl alcohol (PVA) and other single-polymer films are discussed, and their respective advantages (such as low surface energy, high optical transparency, water solubility) and inherent limitations (elastic deformation, demolding difficulties, humidity sensitivity)) are summarized. In order to overcome the above contradiction, researchers developed a composite imprint film structure, including an elastomer–rigid bilayer template and sandwich structure film, which achieved high resolution, conformal contact and facile demolding characteristics through mechanical function decoupling. At the same time, the emerging polymer/transparent electrode composite system (such as AgNWs/PVA, AgNWs/PDMS) gives the film active functions such as self-heating and antistatic ones, which effectively solves the key challenges in thermal management and electrostatic control. This paper comprehensively presents the evolution path from single-material to multi-functional composites, and provides guidance for the design of advanced imprint film for high precision, high reliability and large-scale NIL applications.