Rudresh Ghosh

Dr. Rudresh Ghosh


Research Focus & Metrics

Academic Career Length

11Years (2016-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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28 January 2016 in Journal of Materials Research
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Journal Article
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RGRudresh Ghosh
Rudresh Ghosh
JKJoon-Seok Kim
Joon-Seok Kim
ARAnupam Roy
Anupam Roy
HCHarry Chou
Harry Chou
MVMary Vu
Mary Vu
DADeji Akinwande
Deji Akinwande

15 May 2017 in Applied Physics Letters
Verified
Journal Article
Closed access
PDF file
ARAnupam Roy
Anupam Roy
RGRudresh Ghosh
Rudresh Ghosh
ARAMRITESH RAI
AMRITESH RAI
ASAtresh Sanne
Atresh Sanne
KKKyounghwan Kim
Kyounghwan Kim
SBSanjay K. Banerjee
Sanjay K. Banerjee
We present an ultra-high vacuum scanning tunneling microscopy study of structural defects in molybdenum disulfide thin films grown on silicon substrates by chemical vapor deposition. A distinctive type of grain boundary periodically arranged inside an isolated triangular domain, along with other inter-domain grain boundaries of various types, is observed. These periodic defects, about 50 nm apart and a few nanometers in width, remain hidden in optical or low-resolution microscopy studies. We report a complex growth mechanism that produces 2D nucleation and spiral growth features that can explain the topography in our films.

23 August 2016 in Applied Sciences
Verified
Journal Article
Open access
PDF file
SRSomayyeh Rahimi
Somayyeh Rahimi
RGRudresh Ghosh
Rudresh Ghosh
SKSeohee Kim
Seohee Kim
ADAnanth Dodabalapur
Ananth Dodabalapur
SBSanjay Banerjee
Sanjay Banerjee
DADeji Akinwande
Deji Akinwande
We report the improvement of the electrical performance of field effect transistors (FETs) fabricated on monolayer chemical vapor deposited (CVD) MoS2, by applying an interacting fluoropolymer capping layer (Teflon-AF). The electrical characterizations of more than 60 FETs, after applying Teflon-AF cap, show significant improvement of the device properties and reduced device to device variation. The improvement includes: 50% reduction of the average gate hysteresis, 30% reduction of the subthreshold swing and about an order of magnitude increase of the current on-off ratio. These favorable changes in device performance are attributed to the reduced exposure of MoS2 channels to the adsorbates in the ambient which can be explained by the polar nature of Teflon-AF cap. A positive shift in the threshold voltage of all the measured FETs is observed, which translates to the more desirable enhancement mode transistor characteristics.

8 May 2017 in arXiv
Verified
Preprint
Open access
PDF file
ARAnupam Roy
Anupam Roy
RGRudresh Ghosh
Rudresh Ghosh
ARAmritesh Rai
Amritesh Rai
ASAtresh Sanne
Atresh Sanne
KKKyounghwan Kim
Kyounghwan Kim
SBSanjay K. Banerjee
Sanjay K. Banerjee
We present an ultra-high vacuum scanning tunneling microscopy (STM) study of structural defects in molybdenum disulfide thin films grown on silicon substrates by chemical vapor deposition. A distinctive type of grain boundary periodically arranged inside an isolated triangular domain, along with other inter-domain grain boundaries of various types, is observed. These periodic defects, about 50 nm apart and a few nanometers in width, remain hidden in optical or low-resolution microscopy studies. We report a complex growth mechanism that produces 2D nucleation and spiral growth features that can explain the topography in our films.