The Shanghai soft X-ray Free-Electron Laser facility (SXFEL) is being developed in two steps; the SXFEL test facility (SXFEL-TF), and the SXFEL user facility (SXFEL-UF). The SXFEL-TF is a critical development step towards the construction a soft X-ray FEL user facility in China, and is under commissioning at the Shanghai Synchrotron Radiation Facility (SSRF) campus. The test facility is going to generate 8.8 nm FEL radiation using an 840 MeV electron linac passing through the two-stage cascaded HGHG-HGHG or EEHG-HGHG (high-gain harmonic generation, echo-enabled harmonic generation) scheme. The construction of the SXFEL-TF started at the end of 2014. Its accelerator tunnel and klystron gallery were ready for equipment installation in April 2016, and the installation of the SXFEL-TF linac and radiator undulators were completed by the end of 2016. In the meantime, the SXFEL-UF, with a designated wavelength in the water window region, began construction in November 2016. This was based on upgrading the linac energy to 1.5 GeV, and the building of a second undulator line and five experimental end-stations. Construction status and the future plans of the SXFEL are reported in this paper.

The Shanghai soft X-ray Free-Electron Laser facility (SXFEL), which is the first X-ray FEL facility in China, is being constructed in two phases: the test facility (SXFEL-TF) and the user facility (SXFEL-UF). The test facility was initiated in 2006 and funded in 2014. The commissioning of the test facility was finished in 2020. The user facility was funded in 2016 to upgrade the accelerator energy and build two undulator lines with five experimental end-stations. The output photon energy of the user facility will cover the whole water window range. This paper presents an overview of the SXFEL facility, including considerations of the upgrade, layout and design, construction status, commissioning progress and future plans.

A critical technology for high-volume manufacturing of nanoscale integrated circuits is a high-power extreme ultraviolet (EUV) light source. Over the past decades, laser-produced plasma (LPP) sources have been actively utilized in this field. However, current LPP light sources may provide insufficient average power to enable future manufacturing at the 3 nm node and below. In this context, accelerator-based light sources are considered to be promising tools for EUV lithography. This paper proposes a regenerative amplifier free-electron laser EUV source with harmonic lasing, driven by a superconducting energy-recovery linac (ERL). By utilizing the n th harmonic, the required electron beam energy is reduced to 1 / n of that in conventional schemes. The proposed configuration, employing an electron beam energy of approximately 0.33 GeV with a short-period (16 mm) undulator, is estimated to provide an average EUV power of about 2 kW. This approach significantly reduces the required electron energy and facility size relative to other accelerator-based proposals, thereby offering new possibilities for constructing high-power EUV sources with low-energy ERLs. Published by the American Physical Society 2025

Seeded free-electron lasers (FELs) capable of operating at repetition rates up to the MHz level are in high demand for advanced time-resolved spectroscopies, which require both full longitudinal coherence and high average photon flux in the extreme ultraviolet (EUV) and x-ray regimes. However, conventional external-seeding methods require ultraviolet seed lasers with peak powers on the order of 100 MW, constraining them to lower repetition rates. Here, we report the first lasing and stable operation of a direct-amplification enabled harmonic generation FEL driven by a weak seed laser with only MW-level peak power. Beginning with an ultraviolet seed laser with only 0.75 μJ pulse energy, we demonstrate its direct amplification to over 10 μJ within an 8-m-long modulator. We observe coherent harmonic generation up to the 12th harmonic of the seed and achieve saturation of the 7th harmonic in the radiator. These results represent a crucial milestone toward the realization of MHz-class, fully coherent EUV and x-ray light sources.