Metal-semiconductor-metal structured ultraviolet (UV) photodetector has been fabricated from zinc oxide films. The responsivity of the photodetector can reach 26 000 A/W at 8 V bias, which is the highest value ever reported for a semiconductor ultraviolet photodetector. The origin of the high responsivity has been attributed to the carrier-trapping process occurred in the metal-semiconductor interface, which has been confirmed by the asymmetric barrier height at the two sides of the metal-semiconductor interdigital electrodes. The results reported in this paper provide a way to high responsivity UV photodetectors, which thus may address a step toward future applications of UV photodetectors.

By employing a relatively low growth temperature and oxygen-rich conditions, single-crystalline cubic MgZnO films were prepared. A solar-blind deep ultraviolet (DUV) photodetector was finished on the MgZnO film. The maximum responsivity of the photodetector is 396 mA/W at 10 V bias, which is almost three orders of magnitude larger than the highest value ever reported in MgZnO-based solar-blind photodetectors. The dark current density is $1.5\times {10}^{-11}\text{A}/{\text{cm}}^2$ , comparable with the smallest value ever reported in solar-blind photodetectors. The improved performance reveals that the single-crystalline cubic MgZnO films have great potential applications in DUV optoelectronic devices.