We report self-induced growth of vertically aligned (i.e. along the [111] direction), free-standing InAs nanowires on Si(111) substrates by solid-source molecular beam epitaxy. Implementation of an ultrathin amorphous SiO(x) mask on Si(111) facilitated epitaxial InAs nanowire growth, as confirmed by high-resolution x-ray diffraction 2theta-omega scans and transmission electron microscopy. Depending on growth temperature (in the range of 400-520 degrees C) substantial size variation of both nanowire length and diameter was found under preservation of uniform, non-tapered hexagon-shaped geometries. The majority of InAs nanowires exhibited phase-pure zinc blende crystal structure with few defective regions consisting of stacking faults. Photoluminescence spectroscopy at 20 K revealed peak emission of the InAs nanowires at 0.445 eV, which is approximately 30 meV blueshifted with respect to the emission of the bulk InAs reference due to radial quantum confinement effects. These results show a promising route towards integration of well-aligned, high structural quality InAs-based nanowires with the desired aspect ratio and tailored emission wavelengths on an Si platform.

Semiconductor nanowire (NW) lasers provide significant potential to create a new generation of lasers and on-chip coherent light sources by virtue of their ability to operate as single mode optical waveguides at the nanoscale. Due to their unique geometry, a major benefit lies also in the feasibility for direct integration on silicon (Si), enabling III–V-on-Si NW lasers that could fuel applications in optical interconnects and data communication. In this review, we describe the state-of-the-art and recent progress in GaAs–AlGaAs based NW lasers emitting in the near infrared (NIR) spectral region, with a specific emphasis on integration on a Si platform. First, we explore design rules for the photonic properties in GaAs NW waveguides based on finite difference time domain calculations. The lasing characteristics of GaAs–AlGaAs core–shell NW lasers are then investigated under various different optical pumping schemes ranging from pulsed to continuous wave excitation. We further review recent activities on the realization of low-dimensional quantum heterostructures inside NW cavities as a means to tune lasing wavelength, gain and threshold properties. Ultimately, we describe schemes for monolithic integration of GaAs-based NW lasers directly on Si and show how such vertical nanocavity lasers are excellent candidates for low-threshold lasing, high spontaneous emission coupling (high β -factor lasers), and ultrafast emission characteristics.

We present combined in situ thermal cleaning and intentional doping strategies near the substrate regrowth interface to produce high-quality AlGaN/GaN high electron mobility transistors on semi-insulating (0001) GaN templates with low interfacial impurity concentrations and low buffer leakage. By exposing the GaN templates to an optimized thermal dissociation step in the plasma-assisted molecular beam epitaxy environment, oxygen, carbon, and, to lesser extent, Si impurities were effectively removed from the regrowth interface under preservation of good interface quality. Residual Si was further compensated by C-doped GaN via ${\text{CBr}}_4$ to yield highly resistive GaN buffer layers. Improved N-rich growth conditions at high growth temperatures were then utilized for subsequent growth of the AlGaN/GaN device structure, yielding smooth surface morphologies and low residual oxygen concentration with large insensitivity to the $\left(\text{Al}+\text{Ga}\right)\text{N}$ flux ratio. Room temperature electron mobilities of the two-dimensional electron gas at the AlGaN/GaN interface exceeded $>1750{\text{cm}}^2/\text{V}\text{s}$ and the dc drain current reached $\sim 1.1\text{A}/\text{mm}$ at a $+1\text{V}$ bias, demonstrating the effectiveness of the applied methods.