Seunghwan Lee received a BS degree and an MS degree in electrical engineering from Pohang University of Science and Technology (POSTECH), Republic of Korea, in 2018 and in 2020, respectively. He is currently pursuing a PhD in electrical engineering from POSTECH. His research interests include the characterization and compact modeling of performance and variability for multigate field-effect transistors (FinFETs, nanowire FETs, and nanosheet FETs).
Pohang University of Science and Technology
Pohang, Gyeongbuk, Republic of Korea