Guided-mode resonance (GMR) gratings have emerged as a promising sensing technology, with a growing number of applications in diverse fields. This study aimed to identify the optimal design parameters of a simple-to-fabricate and high-performance one-dimensional GMR grating. The structural parameters of the GMR grating were optimized, and a high-refractive-index thin film was simulated on the grating surface, resulting in efficient confinement of the electric field energy within the waveguide. Numerical simulations demonstrated that the optimized GMR grating exhibited remarkable sensitivity (252 nm/RIU) and an extremely narrow full width at half maximum (2 × 10−4 nm), resulting in an ultra-high figure of merit (839,666) at an incident angle of 50°. This performance is several orders of magnitude higher than that of conventional GMR sensors. To broaden the scope of the study and to make it more relevant to practical applications, simulations were also conducted at incident angles of 60° and 70°. This holistic approach sought to develop a comprehensive understanding of the performance of the GMR-based sensor under diverse operational conditions.
Diffraction gratings are becoming increasingly widespread in optical applications, notably in lasers. This study presents the work on the characterization and evaluation of Multilayer Dielectric Diffraction Gratings (MDG) based on the finite element method using Comsol MultiPhysics software. The optimal multilayer dielectric diffraction grating structure using a rectangular three-layer structure consisting of an aluminum oxide Al2O3 layer sandwiched between two silicon dioxide SiO2 layers on a multilayer dielectric mirror is simulated. Results show that this MDG for non-polarized lasers at 1064 nm with a significantly enhanced −1st diffraction efficiency of 97.4%, reaching 98.3% for transverse-electric (TE) polarization and 96.3% for transverse-magnetic (TM) polarization. This design is also preferable in terms of the laser damage threshold (LDT) because most of the maximum electric field is spread across the high LDT material SiO2 for TE polarization and scattered outside the grating for TM polarization. This function allows the system to perform better and be more stable than normal diffraction grating under a high-intensity laser.