In this report, we demonstrate a novel high-temperature Hall effect sensor that is based on quasi-free-standing monolayer graphene epitaxially grown on high-purity semiinsulating (SI) on-axis 4H-SiC(0001) substrate in a chemical vapor deposition process. To ensure statistical perspective, characteristics of 23 elements are determined as a function of temperature ranging from 300 to 770 K. Passivated with a 100-nm-thick atomic-layer-deposited aluminum oxide, the sensor offers current-mode sensitivity of 80 V/AT with thermal stability of -0.02%/K within the range between 300 and 573 K, and -0.06%/K between 573 and 770 K. The sensor's room-temperature output voltage is monitored in the magnetic field from -300 to +300 mT and its offset voltage at 0 T is assessed. Its high-temperature electrical properties are explained through a double-carrier transport involving spontaneous-polarization-induced holes in the graphene layer and thermally activated electrons emitted from a deep acceptor level related to silicon vacancy VSi^1-/2- occupying the k site of the 4H-SiC lattice. The sensor is compared with a previously reported one on vanadium-compensated SI on-axis 6H-SiC(0001). The new sensor's applicability to magnetic field detection at high temperatures is verified.

The ability to precisely measure magnetic fields under extreme operating conditions is becoming increasingly important as a result of the advent of modern diagnostics for future magnetic-confinement fusion devices. These conditions are recognized as strong neutron radiation and high temperatures (up to 350 °C). We report on the first experimental comparison of the impact of neutron radiation on graphene and indium antimonide thin films. For this purpose, a 2D-material-based structure was fabricated in the form of hydrogen-intercalated quasi-free-standing graphene on semi-insulating high-purity on-axis 4H-SiC(0001), passivated with an Al₂O₃ layer. InSb-based thin films, donor doped to varying degrees, were deposited on a monocrystalline gallium arsenide or a polycrystalline ceramic substrate. The thin films were covered with a SiO₂ insulating layer. All samples were exposed to a fast-neutron fluence of ≈$7\times {10}^{17}$ cm⁻². The results have shown that the graphene sheet is only moderately affected by neutron radiation compared to the InSb-based structures. The low structural damage allowed the graphene/SiC system to retain its electrical properties and excellent sensitivity to magnetic fields. However, InSb-based structures proved to have significantly more post-irradiation self-healing capabilities when subject to proper temperature treatment. This property has been tested depending on the doping level and type of the substrate.

In this report, we demonstrate a method for the enhancement of Raman active modes of hydrogen-intercalated quasi-free-standing epitaxial chemical vapor deposition graphene and the underlying semi-insulating 6H–SiC(0001) substrate through constructive signal interference within atomic-layer-deposited amorphous Al₂O₃ passivation. We find that an optimum Al₂O₃ thickness of 85 nm for the graphene 2D mode and one of 82 nm for the SiC longitudinal optical A₁ mode at 964 cm^–1 enable a 60% increase in their spectra intensities. We demonstrate the method's efficiency in Raman-based determination of the dielectric thickness and high-resolution topographic imaging of a graphene surface.