Oscar Alberto López Galán

Dr. Oscar Alberto López Galán

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Research Focus & Metrics

Academic Career Length

7Years (2020-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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9 March 2023 in Advanced Materials Interfaces
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Journal Article
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Oscar Alberto López GalánOscar Alberto López Galán
Oscar Alberto López Galán
IPIsrael Perez
Israel Perez
JNJohn Nogan
John Nogan
Manuel RamosManuel Ramos
Manuel Ramos
The electronic structure and thermoelectric properties of MoX2 (X = S, Se) Van der Waals heterojunctions are reported, with the intention of motivating the design of electronic devices using such materials. Calculations indicate the proposed heterojunctions are thermodynamically stable and present a band gap reduction from 1.8 eV to 0.8 eV. The latter effect is highly related to interactions between metallic d‐character orbitals and chalcogen p‐character orbitals. The theoretical approach allows to predict a transition from semiconducting to semi‐metallic behavior. The band alignment indicates a type‐I heterojunction and band offsets of 0.2 eV. Transport properties show clear n‐type nature and a high Seebeck coefficient at 300 K, along with conductivity values (σ/τ) in the order of 1020. Lastly, using the Landauer approach and ballistic transport, the proposed heterojunctions can be modeled as a channel material for a typical one‐gate transistor configuration predicting subthreshold values of ≈60 mV dec−1 and field–effect mobilities of ≈160 cm−2 V−1 s−1.

1 January 2021 in Catalysis Today
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Oscar Alberto López GalánOscar Alberto López Galán
Oscar Alberto López Galán
GFGuillermo Carbajal Franco
Guillermo Carbajal Franco

1 June 2022 in Catalysis Today
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Journal Article
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JRJorge Reyna-Alvarado
Jorge Reyna-Alvarado
Oscar Alberto López GalánOscar Alberto López Galán
Oscar Alberto López Galán
Manuel RamosManuel Ramos
Manuel Ramos
JRJosé Rodríguez
José Rodríguez
Raúl Pérez-HernándezRaúl Pérez-Hernández
Raúl Pérez-Hernández

16 December 2021 in MRS Communications
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Oscar Alberto López GalánOscar Alberto López Galán
Oscar Alberto López Galán
Manuel RamosManuel Ramos
Manuel Ramos
JNJohn Nogan
John Nogan
AÁAlejandro Ávila-García
Alejandro Ávila-García
TBTorben Boll
Torben Boll
MHMartin Heilmaier
Martin Heilmaier
We report a combination of experimental results with density functional theory (DFT) calculations to understand electronic structure of indium tin oxide and molybdenum disulfide (ITO–MoS2) interface. Our results indicate ITO and MoS2 conform an n-type Schottky barrier of c.a. − 1.0 eV due to orbital interactions; formation of an ohmic contact is caused by semiconducting and metal behavior of ITO as a function of crystal plane orientation. ITO introduces energy levels around the Fermi level in all interface models in the Γ-Μ-Κ-Γ path. The resulted Van der Waals interface and the values of Schottky barrier height enhance electron carrier injection. Graphical abstract

1 January 2020 in Molecular Catalysis
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LOLais F. Oton
Lais F. Oton
DCDavi C. Coelho
Davi C. Coelho
AOAlcineia Oliveira
Alcineia Oliveira
JAJesuina C.S. de Araujo
Jesuina C.S. de Araujo
RLRossano Lang
Rossano Lang
Manuel RamosManuel Ramos
Manuel Ramos

24 October 2022 in MRS Communications
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Oscar Alberto López GalánOscar Alberto López Galán
Oscar Alberto López Galán
Manuel RamosManuel Ramos
Manuel Ramos
We present a theoretical study for MoS2/MoSe2 Van der Waals heterojunction in the armchair direction, and periodicity in the y-direction, under the mechanical deformation process to explore electronic structure vs. curvature angle. Our findings reveal that the heterojunction maintains chemical stability, even under high deformation, and the bandgap of the heterojunction is inversely proportional to curvature angle; the shift from semiconductor—with a bandgap of 0.8 eV—to semimetal occurs at deformation angles as low as 5°, having a gapless material. The mentioned transition corresponds mainly to distortion of half-filled molybdenum d-orbitals and chalcogen–chalcogen p-orbitals overlapping near the Fermi level. Graphical abstract