Dominique Vuillaume

Mr. Dominique Vuillaume

orcid

Research Focus & Metrics

Academic Career Length

42Years (1985-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

View All Publications
1 October 1997 in Journal of the American Chemical Society
Verified
Journal Article
Closed access
RMRobert M. Metzger
Robert M. Metzger
BCBo Chen
Bo Chen
UHUlf Höpfner
Ulf Höpfner
MLM. V. Lakshmikantham
M. V. Lakshmikantham
DVDominique Vuillaume
Dominique Vuillaume
GAGeoffrey J. Ashwell
Geoffrey J. Ashwell

1 May 2006 in Analytica Chimica Acta
Verified
Journal Article
Closed access
DADinesh K Aswal
Dinesh K Aswal
SLS. Lenfant
S. Lenfant
DGD. Guerin
D. Guerin
JYJ.V. Yakhmi
J.V. Yakhmi
DVDominique Vuillaume
Dominique Vuillaume

13 January 2010 in Advanced Functional Materials
Verified
Journal Article
Closed access
PDF file
FAFabien Alibart
Fabien Alibart
SPStéphane Pleutin
Stéphane Pleutin
DGDavid Guérin
David Guérin
CNChristophe Novembre
Christophe Novembre
SLStéphane Lenfant
Stéphane Lenfant
DVDominique Vuillaume
Dominique Vuillaume

17 June 1996 in Physical Review Letters
Verified
Journal Article
Closed access
PDF file
CBC. Boulas
C. Boulas
JDJ. V. Davidovits
J. V. Davidovits
FRF. Rondelez
F. Rondelez
DVDominique Vuillaume
Dominique Vuillaume
Self-assembled monolayers of long chain alkanes deposited on silicon wafers using an optimally designed procedure exhibit very large energy barriers ( ∼4.5 eV) to carrier tunneling. The dc conductivity is found to be ∼4.6×10−15 S/cm, close to that of bulk polyethylene, and independent of monolayer thickness. This demonstrates that the tunneling contribution to the overall conductivity can be made negligible when the organic structure is densely packed and highly ordered. Distinctly higher conductivity values are observed with disordered monolayers.

3 April 2000 in Applied Physics Letters
Verified
Journal Article
Closed access
PDF file
JCJ. Collet
J. Collet
OTO. Tharaud
O. Tharaud
ACA. Chapoton
A. Chapoton
DVDominique Vuillaume
Dominique Vuillaume
We made nanometer-scale (gate length of 30 nm) organic thin-film transistors using a self-assembled monolayer (2 nm thick) as a gate insulator. The fabrication steps combine electron-beam lithography and lift-off techniques for the deposition of both metal electrodes and organic semiconductors with a chemical approach (self-assembly of organic molecules) to fabricate the gate insulator. Good performances of these transistors (with a record subthreshold slop of 350 mV/decade and a cutoff frequency of 20 kHz) and low-voltage operation (<2 V) are demonstrated down to a gate length of 200 nm. A gate voltage modulation of the source-to-drain tunnel current is demonstrated for the 30 nm gate length device.

2 March 2015 in Frontiers in Neuroscience
Verified
Journal Article
Open access
PDF file
SSSylvain SAIGHI
Sylvain SAIGHI
CMChristian G. Mayr
Christian G. Mayr
TSTeresa Serrano-Gotarredona
Teresa Serrano-Gotarredona
HSHeidemarie Schmidt
Heidemarie Schmidt
GLGwendal Lecerf
Gwendal Lecerf
Alejandro Linares-BarrancoAlejandro Linares-Barranco
Alejandro Linares-Barranco
Memristive devices present a new device technology allowing for the realization of compact nonvolatile memories. Some of them are already in the process of industrialization. Additionally, they exhibit complex multilevel and plastic behaviors, which make them good candidates for the implementation of artificial synapses in neuromorphic engineering. However, memristive effects rely on diverse physical mechanisms, and their plastic behaviors differ strongly from one technology to another. Here, we present measurements performed on different memristive devices and the opportunities that they provide. We show that they can be used to implement different learning rules whose properties emerge directly from device physics: real time or accelerated operation, deterministic or stochastic behavior, long term or short term plasticity. We then discuss how such devices might be integrated into a complete architecture. These results highlight that there is no unique way to exploit memristive devices in neuromorphic systems. Understanding and embracing device physics is the key for their optimal use.