Duy Phong Pham

Prof. Dr. Duy Phong Pham

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Research Focus & Metrics

Academic Career Length

14Years (2013-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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26 April 2024 in Transactions on Electrical and Electronic Materials
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Journal Article
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ZPZhong Pan
Zhong Pan
YHYifan Hu
Yifan Hu
JCJingwen Chen
Jingwen Chen
FWFucheng Wang
Fucheng Wang
YJYeojin Jeong
Yeojin Jeong
JYJunsin Yi
Junsin Yi

18 January 2022 in Journal of Power Sources
Verified
Journal Article
Closed access
Duy Phong PhamDuy Phong Pham
Duy Phong Pham
JYJunsin Yi
Junsin Yi

2 April 2020 in Energies
Verified
Journal Article
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MKMuhammad Q. Khokhar
Muhammad Q. Khokhar
SHAHZADA QAMAR HUSSAINSHAHZADA QAMAR HUSSAIN
SHAHZADA QAMAR HUSSAIN
Duy Phong PhamDuy Phong Pham
Duy Phong Pham
SLSunhwa Lee
Sunhwa Lee
Hyeong Gi ParkHyeong Gi Park
Hyeong Gi Park
JYJunsin Yi
Junsin Yi
In this work, to ameliorate the quantum efficiency (QE), we made a valuable development by using wide band gap material, such as lithium fluoride (LiFx), as an emitter that also helped us to achieve outstanding efficiency with silicon heterojunction (SHJ) solar cells. Lithium fluoride holds a capacity to achieve significant power conversion efficiency because of its dramatic improvement in electron extraction and injection, which was investigated using the AFORS-HET simulation. We used AFORS-HET to assess the restriction of numerous parameters which also provided an appropriate way to determine the role of diverse parameters in silicon solar cells. We manifested and preferred lithium fluoride as an interfacial layer to diminish the series resistance as well as shunt leakage and it was also beneficial for the optical properties of a cell. Due to the wide band gap and better surface passivation, the LiFx encouraged us to utilize it as the interfacial as well as the emitter layer. In addition, we used the built-in electric and band offset to explore the consequence of work function in the LiFx as a carrier selective contact layer. We were able to achieve a maximum power conversion efficiency (PEC) of 23.74%, fill factor (FF) of 82.12%, Jsc of 38.73 mA cm−2, and Voc of 741 mV by optimizing the work function and thickness of LiFx layer.

1 February 2023 in Optical Materials
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Journal Article
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Duy Phong PhamDuy Phong Pham
Duy Phong Pham
HKHongrae Kim
Hongrae Kim
JCJiwon Choi
Jiwon Choi
DODonghyun Oh
Donghyun Oh
YCYung-Bin Chung
Yung-Bin Chung
JYJunsin Yi
Junsin Yi

1 June 2021 in Physica B: Condensed Matter
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Journal Article
Closed access
Duy Phong PhamDuy Phong Pham
Duy Phong Pham
SLSunhwa Lee
Sunhwa Lee
JYJunsin Yi
Junsin Yi

31 December 2021 in Applied Sciences
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Journal Article
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MKMuhammad Q. Khokhar
Muhammad Q. Khokhar
SHAHZADA QAMAR HUSSAINSHAHZADA QAMAR HUSSAIN
SHAHZADA QAMAR HUSSAIN
MZMuhammad Aleem Zahid
Muhammad Aleem Zahid
Duy Phong PhamDuy Phong Pham
Duy Phong Pham
Eun-Chel ChoEun-Chel Cho
Eun-Chel Cho
JYJunsin Yi
Junsin Yi
We report on the tunnel oxide passivated contact (TOPCon) using a crystalline nanostructured silicon-based layer via an experimental and numerical simulation study. The minority carrier lifetime and implied open-circuit voltage reveals an ameliorated passivation property, which gives the motivation to run a simulation. The passivating contact of an ultra-thin silicon oxide (1.2 nm) capped with a plasma enhanced chemical vapor deposition (PECVD) grown 30 nm thick nanocrystalline silicon oxide (nc-SiOx), provides outstanding passivation properties with low recombination current density (Jo) (~1.1 fA/cm2) at a 950 °C annealing temperature. The existence of a thin silicon oxide layer (SiO2) at the rear surface with superior quality (low pinhole density, Dph < 1 × 10−8 and low interface trap density, Dit ≈ 1 × 108 cm−2 eV−1), reduces the recombination of the carriers. The start of a small number of transports by pinholes improves the fill factor (FF) up to 83%, reduces the series resistance (Rs) up to 0.5 Ω cm2, and also improves the power conversion efficiency (PEC) by up to 27.4%. The TOPCon with a modified nc-SiOx exhibits a dominant open circuit voltage (Voc) of 761 mV with a supreme FF of 83%. Our simulation provides an excellent match with the experimental results and supports excellent passivation properties. Overall, our study proposed an ameliorated knowledge about tunnel oxide, doping in the nc-SiOx layer, and additionally about the surface recombination velocity (SRV) impact on TOPCon solar cells.