Atomically thin molybdenum disulfide (MoS₂), a member of the transition metal dichalcogenide (TMDC) family, has emerged as the prototypical two-dimensional (2D) semiconductor with a multitude of interesting properties and promising device applications spanning all realms of electronics and optoelectronics. While possessing inherent advantages over conventional bulk semiconducting materials (such as Si, Ge and III-Vs) in terms of enabling ultra-short channel and, thus, energy efficient field-effect transistors (FETs), the mechanically flexible and transparent nature of MoS₂ makes it even more attractive for use in ubiquitous flexible and transparent electronic systems. However, before the fascinating properties of MoS₂ can be effectively harnessed and put to good use in practical and commercial applications, several important technological roadblocks pertaining to its contact, doping and mobility (µ) engineering must be overcome. This paper reviews the important technologically relevant properties of semiconducting 2D TMDCs followed by a discussion of the performance projections of, and the major engineering challenges that confront, 2D MoS₂-based devices. Finally, this review provides a comprehensive overview of the various engineering solutions employed, thus far, to address the all-important issues of contact resistance (R_C), controllable and area-selective doping, and charge carrier mobility enhancement in these devices. Several key experimental and theoretical results are cited to supplement the discussions and provide further insight.

Electrostatic gating of two-dimensional (2D) materials with ionic liquids (ILs), leading to the accumulation of high surface charge carrier densities, has been often exploited in 2D devices. However, the intrinsic liquid nature of ILs, their sensitivity to humidity, and the stress induced in frozen liquids inhibit ILs from constituting an ideal platform for electrostatic gating. Here we report a lithium-ion solid electrolyte substrate, demonstrating its application in high-performance back-gated n-type MoS₂ and p-type WSe₂ transistors with sub-threshold values approaching the ideal limit of 60 mV/dec and complementary inverter amplifier gain of 34, the highest among comparable amplifiers. Remarkably, these outstanding values were obtained under 1 V power supply. Microscopic studies of the transistor channel using microwave impedance microscopy reveal a homogeneous channel formation, indicative of a smooth interface between the TMD and underlying electrolytic substrate. These results establish lithium-ion substrates as a promising alternative to ILs for advanced thin-film devices.

To achieve large area growth of transition metal dichalcogenides of uniform monolayer thickness, we demonstrate metal–organic chemical vapor deposition (MOCVD) growth under low pressure followed by a high-temperature sulfurization process under atmospheric pressure (AP). Following sulfurization, the MOCVD-grown continuous MoS₂ film transforms into compact triangular crystals of uniform monolayer thickness as confirmed from the sharp distinct photoluminescence peak at 1.8 eV. Raman and X-ray photoelectron spectroscopies confirm that the structural disorders and chalcogen vacancies inherent to the as-grown MOCVD film are substantially healed and carbon/oxygen contaminations are heavily suppressed. The as-grown MOCVD film has a Mo/S ratio of 1:1.6 and an average defect length of ∼1.56 nm, which improve to 1:1.97 and ∼21 nm, respectively, upon sulfurization. The effect of temperature and duration of the sulfurization process on the morphology and stoichiometry of the grown film is investigated in detail. Compared to the APCVD growth, this two-step growth process shows more homogenous distribution of the triangular monolayer MoS₂ domains across the entire substrate, while demonstrating comparable electrical performance.

Although electrostatic gating with liquid electrolytes has been thoroughly investigated to enhance electrical transport in two-dimensional (2D) materials, solid electrolyte alternatives are now actively being researched to overcome the limitations of liquid dielectrics. Here, we report direct growth of few-layer ($3-4L$) molybdenum disulfide (${\mathrm{MoS}}_2$), a prototypical 2D transition metal dichalcogenide (TMD), on lithium-ion solid electrolyte substrate by chemical vapor deposition (CVD), and demonstrate a transfer-free device fabrication method. The growth resulted in 5–10 μm sized triangular ${\mathrm{MoS}}_2$ single crystals as confirmed by Raman spectroscopy, x-ray photoelectron spectroscopy, and scanning electron microscopy. Field-effect transistors (FETs) fabricated on the as-grown few-layer crystals show near-ideal gating performance with room temperature subthreshold swings around 65 mV/decade while maintaining an ON/OFF ratio around ${10}^5$. Field-effect mobility in the range of $42–49\mathrm{c}{\mathrm{m}}^2{\mathrm{V}}^{–1}{\mathrm{s}}^{–1}$ and current densities as high as 120 μA/μm with 0.5 μm channel length has been achieved, back-gated by the solid electrolyte. This is the highest reported mobility among comparable FETs on as-grown single/few-layer CVD ${\mathrm{MoS}}_2$. This growth and transfer-free device fabrication method on solid electrolyte substrates can be applied to other 2D TMDs for studying advanced thin-film transistors and interesting physics, and is amenable to diverse surface science experiments, otherwise difficult to realize with liquid electrolytes.