The effect of the intensification of electron emission in a plasma-cathode diode with a grid-stabilized plasma boundary has been investigated. For a pulsed (100-mus) electron beam of 15-20-keV energy that passes through the plasma formed as a result of gas ionization by an electron beam, it has been revealed that an increase in pressure increases the emission current at a fixed plasma-cathode discharge current, and the emission current can become greater in magnitude than the discharge current. It has been shown that a significant increase in electron-beam current is provided by the secondary ion-electron emission that results from the bombardment of the emission electrode surface by the accelerated ions coming from the boundary of the anode plasma.

Silicate-containing hydroxyapatite-based coatings with different structure and calcium/phosphate ratios were prepared by radio-frequency magnetron sputtering on silicon and titanium substrates, respectively. Scanning electron microscopy, X-ray diffraction and IR spectroscopy were used to investigate the effect of the substrate bias on the properties of the silicate-containing hydroxyapatite-based coatings. The deposition rate, composition, and microstructure of the deposited coatings were all controlled by changing the bias voltage from grounded (0 V) to −50 and −100 V. The biocompatibility was assessed by cell culture with human osteoblast-like cells (MG-63 cell line), showing a good biocompatibility and cell growth on the substrates.

Phase formation and surface hardening in the 100-nm-thick Al(film)/Ti(substrate) system under conditions of pulsed electron-beam melting (∼15 keV, ∼3 μs, 3–4 J/cm2) have been studied depending on the...