Chemical bonding and local order around the different atoms of thick amorphous deposits ⩽0.67] prepared with chemical vapor deposition at 1000–1200 °C using have been investigated using x-ray photoelectron spectroscopy (XPS), Raman spectrometry, Fourier transform infrared spectrometry (FT-IR), electron energy loss spectroscopy (EELS) and magic-angle spinning nuclear magnetic resonance spectrometry (MAS-NMR). XPS analyses have shown that the main bonds are Si–C, Si–N, and C–C, and have suggested the existence of C–N bonds. According to Raman analyses and complementary FT-IR absorption of thin films, the coatings are nonhydrogenated. Si, C and N atomic chemical environments are more complicated than in a mixture of pure phases. The examination of the line shapes recorded by XPS have allowed one to state the existence of units. Mixed coordination shells around silicon have been confirmed by EELS analyses. Additionally, FT-IR reflection analyses have proved that Si is both bonded with N and C. Indirect indication has been obtained owing to the MAS-NMR analyses of powders. Raman analyses have been conclusive to assume that C–C bonds correspond to a mixed carbon configuration linked with tetrahedra with