Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons have been used to circumvent the diffraction limit as they have shorter wavelengths. However, this approach has a trade-off between resolution and energy efficiency that arises from the substantial momentum mismatch. Here we report a novel multi-stage scheme that is capable of efficiently compressing the optical energy at deep sub-wavelength scales through the progressive coupling of propagating surface plasmons (PSPs) and localized surface plasmons (LSPs). Combining this with airbearing surface technology, we demonstrate a plasmonic lithography with 22 nm half-pitch resolution at scanning speeds up to 10 m/s. This low-cost scheme has the potential of higher throughput than current photolithography, and it opens a new approach towards the next generation semiconductor manufacturing.

There is demand for scaling up 3D printing throughput, especially for the multi-photon 3D printing process that provides sub-micrometer structuring capabilities required in diverse fields. In this work, high-speed projection multi-photon printing is combined with spatiotemporal focusing for fabrication of 3D structures in a rapid, layer-by-layer, and continuous manner. Spatiotemporal focusing confines printing to thin layers, thereby achieving print thicknesses on the micron and sub-micron scale. Through projection of dynamically varying patterns with no pause between patterns, a continuous fabrication process is established. A numerical model for computing spatiotemporal focusing and imaging is also presented which is verified by optical imaging and printing results. Complex 3D structures with smooth features are fabricated, with millimeter scale printing realized at a rate above 10⁻³ mm³ s⁻¹. This method is further scalable, indicating its potential to make fabrications of 3D structures with micro/nanoscale features in a practical time scale a reality.

Here we demonstrate the use of projection stereo-micro-lithography as a low-cost and high-throughput method to fabricate three dimensional (3D) microbattery. An Ultraviolet (UV)-curable Poly (ethylene glycol) (PEG)-base gel polymer electrolyte (GPE) is first created. The GPE is then used as a resin for micro-stereolithography in order to build a 3D architecture of battery's electrolyte. Active materials, LiFePO₄ (LFP) and Li₄Ti₅O₁₂ (LTO), are mixed with carbon black and the GPE resin, which is then flown into the 3D structure. Aluminum (Al) foil is cut and inserted as a current collector. The GPE is characterized and the microbattery is performed a cycling test. Results show a feasibility of microbattery fabrication using projection micro-stereolithography.