Chemical vapor deposition (CVD) diamond is a prospective thin film material for cutting tools applications due to the extreme combination of hardness, chemical inertness, and thermal conductivity. However, the CVD diamond cutting ability of ferrous materials is strongly limited due to its extreme affinity to iron, cobalt, or nickel. The diamond–iron interaction and the diffusion behavior in this system are not well studied and are believed to be similar to the graphite–iron mechanism. In this article, we focus on the medium-temperature working range of 400–800 °C of a CVD diamond–Fe system and show that for these temperatures etching of diamond by Fe is not as strong as is generally accepted. The starting point of the diamond graphitization in contact with iron was found around 400 °C. Our results show that CVD diamond is applicable for the cutting of ferrous materials under medium-temperature conditions.

Given the exceptional characteristics of diamond films, they have become increasingly popular in the fields of medicine, microelectronics, and detector electronics. However, despite all the advantages, there are many technological problems that complicate their widespread application and impose limitations on diamond use in technological processes. In this study, we proposed a new technique for obtaining a complex topology of polycrystalline diamond coatings by selective seeding of the substrate by nucleation centers and subsequent surface treatment with reactive ion etching to reduce the number of parasitic particles. As a result, diamond films were obtained with a high particle concentration in the film region and high repeatability of the pattern. Moreover, parasitic particles influenced neutralization in areas where film coverage was not needed. The effect of the diamond nanoparticle concentration in a photoresist and the effect of reactive ion etching on the formation of a continuous film and the removal of parasitic nucleation centers were examined. The relative simplicity, low power consumption, and high efficiency of this method make it attractive for both industrial and scientific applications.