In this paper, the results on the fabrication of ferroelectric membranes as vascular patches with modified surfaces are presented. For the modification of a membrane surface contacting blood, DLC coating was deposited using the pulsed vacuum arc deposition technique. The physico-chemical properties and cytotoxicity of the membranes modified under various conditions were studied. It was found that DLC coatings do not affect membrane microstructure, preserving its crystal structure as well as its high strength and elongation. It was revealed that an increase in the capacitor storage voltage results in the rise in sp²- and sp-hybridized carbon concentration, which makes it possible to control the chemical structure and surface energy of the modified surface. The experiments with 3T3L1 fibroblasts showed no toxic effects of the materials extracts.

This article reports on the investigation of technological features magnetron sputtering for deposition anti-reflection layers in low-emission (low-e) coatings. The three-layer TiO2-Cu-TiO2 films were deposited by dual and planar magnetron sputtering systems (MS) on glass substrate. Studies of the current-voltage characteristics (CVC) and the hysteresis effect show that deposition of anti-reflection layers is possible in the transition mode with higher rates. For planar magnetron, the stability of electrical discharge parameters is achieved at 60 % O2 content in mixture. The calculations optical band gap Eg show that anti-reflective films have a rutile or anatase phases that depending on the content O2 in gas mixture. The optimum deposition conditions of TiO2 films were determined for all modifications of magnetrons. Anti-reflective layers, which are deposited by balanced dual MS, improve the transparency of low-e coatings (integral TVIS increase in 15%).

This article reports on the investigation of mechanical properties of carbon films deposited by dual magnetron sputtering system with closed and mirror magnetic field. There is shown that a-C films with predominantly sp²-phase have relatively high hardness (up to 20 GPa) and low friction index (~0.01). The influence of magnetic field on friction index is determined. The analysis of experimental data shows the obtained a-C samples can be used for biomedicine applications.

The article reports on the influence of magnetic field (B field) configuration of dual magnetron on carbon based films properties. The films deposition was performed by means of magnetron sputtering of carbon targets in argon plasma at total pressure range (0.1-1.6 Pa). The carbon films aren’t composed of chemical impurities as measured by Auger electron spectroscopy (AES). The B field configurations affect to a greater extent on mechanical properties and don’t have weighty impact on deposition rates. For «mirror» B field, the films hardness (H) is a higher. The rise of Ar pressure results in a decrease H from 20 to 9 GPa. It is peculiar to a-C and ta-C films. The effect of B field configurations on elastic module (E) is shown in higher pressures.

The article reports on the aspects of reactive deposition ultra-thin TiO_x films (50 nm) by means of dual magnetron system with mirror and closed magnetic field (B field) configurations. The hysteresis effect of electrical discharge characteristics and oxygen partial pressure P(O₂) are presented. The dual magnetron with closed B field configuration has less hysteresis peculiarities and transits back to metallic deposition mode at higher O₂ flow rate (Q). The deposition rates don’t depend on B field configuration and correlate with changing of P(O₂) and discharge voltage. The refractive spectra and energy of band gap, which are measured by UV-visible spectrophotometry and ellipsometry (λ=632.8 nm) methods, have strong dependence on Q(O₂).