We present a methodology to fabricate one-dimensional porous silicon (PSi) photonic crystals in the visible range by controlled etching and monitored by photoacoustics. Photoacoustic can record in-situ information about changes in the optical path and chemical reaction as well as in temperature, refractive index, and roughness during porous layers formation. Radiometry imaging can determine the carrier distribution of c-Si substrate that is a fundamental parameter to obtain high-quality PSi films. An electrochemical cell was calibrated through a series of single PSi layers that allows knowing the PA amplitude period, porosity, and roughness as a function of the current density. Optical properties of single layers were determined using the reflectance response in the UV-Vis range to solve the inverse problem through genetic algorithms. PhC structures were designed using the transfer matrix method and effective media approximation.Based on the growth kinetics of PSi single layers, those structures were fabricated by electrochemical etching monitored and controlled by in-situ photoacoustics.