Yang Tong

Prof. Yang Tong


Research Focus & Metrics

Academic Career Length

6Years (2021-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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12 October 2023 in Nature Physics
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Journal Article
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HYHuan Yong
Huan Yong
HPHailong Peng
Hailong Peng
HWHui Wang
Hui Wang
YTYang Tong
Yang Tong
YWYutian Wang
Yutian Wang
HBHaiyang Bai
Haiyang Bai

7 February 2025 in Materials Science and Engineering: A
Verified
Journal Article
Closed access
YSYuxin Sun
Yuxin Sun
CWCaixia Wang
Caixia Wang
CSCaijuan Shi
Caijuan Shi
RSRuixin Sheng
Ruixin Sheng
WLWeidong Li
Weidong Li
YTYang Tong
Yang Tong

17 May 2024 in Metals
Verified
Journal Article
Open access
PDF file
DZDawei Zhou
Dawei Zhou
WLWeidong Li
Weidong Li
CWCaixia Wang
Caixia Wang
RSRuixin Sheng
Ruixin Sheng
WLWeidong Li
Weidong Li
YTYang Tong
Yang Tong
The development of strong and ductile alloys for application in cryogenic temperatures has long been sought after. In this work, we have developed a face-centered cubic Ni10Co56.5V33.5 multi-principal element alloy (MPEA) that exhibits a balanced combination of high strength and good ductility at 77 K, based on the considerations of large local lattice distortion (LLD) and low stacking fault energy. The small-grained Ni10Co56.5V33.5 MPEA exhibits a yield strength of 1400 MPa and an ultimate tensile strength of 1890 MPa, while preserving a good ductility of 23%. Moreover, precession electron diffraction and transmission electron microscopy revealed multiple deformation mechanisms, including wavy dislocations, atypically severely twisted dislocation bands, hierarchical stacking faults, and deformation twins, which are implicated in the alloy’s outstanding mechanical performance. These insights offer a strategic guide for the design of strong and ductile alloys, particularly for utilization in extreme environments.

15 July 2023 in Metals and Materials International
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Journal Article
Closed access
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JQJingbo Qiao
Jingbo Qiao
HZHongmin Zhang
Hongmin Zhang
HMHaoyan Meng
Haoyan Meng
FMFanchao Meng
Fanchao Meng
YTYang Tong
Yang Tong
SCShuying Chen
Shuying Chen

4 November 2023 in Journal of Materials Research and Technology
Verified
Journal Article
Open access
CWCaixia Wang
Caixia Wang
RSRuixing Sheng
Ruixing Sheng
DZDawei Zhou
Dawei Zhou
WLWeidong Li
Weidong Li
SCShuying Chen
Shuying Chen
YTYang Tong
Yang Tong

14 August 2025 in Advanced Science
Verified
Journal Article
Open access
GVGihan Velisa
Gihan Velisa
Eva ZarkadoulaEva Zarkadoula
Eva Zarkadoula
DIDecebal Iancu
Decebal Iancu
MMMaria-Diana Mihai
Maria-Diana Mihai
ABAlexandre Boulle
Alexandre Boulle
William WeberWilliam Weber
William Weber
Thermally activated annealing in semiconductors faces inherent limitations, such as dopant diffusion. Here, a nonthermal pathway is demonstrated for a complete structural restoration in predamaged germanium via ionization‐induced recovery. By combining experiments and modeling, this study reveals that the energy transfer of only 2.4 keV nm −1 from incident ions to target electrons can effectively annihilate pre‐existing defects and restore the original crystalline structure at room temperature. Moreover, it is revealed that the irradiation‐induced crystalline‐to‐amorphous (c/a) transformation in Ge is reversible, a phenomenon previously considered unattainable without additional thermal energy imposed during irradiation. For partially damaged Ge, the overall damage fraction decreases exponentially with increasing fluence. Surprisingly, the recovery process in preamorphized Ge starts with defect recovery outside the amorphous layer and a shrinkage of the amorphous thickness. After this initial stage, the remaining damage decreases slowly with increasing fluence, but full restoration of the pristine state is not achieved. These differences in recovery are interpreted in the framework of structural differences in the initial defective layers that affect recovery kinetics. This study provides new insights on reversing the c/a transformation in Ge using highly‐ionizing irradiation and has broad implications across materials science, radiation damage mitigation, and fabrication of Ge‐based devices.