Grating based X-ray differential phase contrast imaging (DPCI) allows for high contrast imaging of materials with similar absorption characteristics. In the last years’ publications, small animals or parts of the human body like breast, hand, joints

Single-shot grating-based phase-contrast imaging techniques offer additional contrast modalities based on the refraction and scattering of X-rays in a robust and versatile configuration. The utilization of a single optical element is possible in such methods, allowing the shortening of the acquisition time and increasing flux efficiency. One of the ways to upgrade single-shot imaging techniques is to utilize customized optical components, such as two-dimensional (2D) X-ray gratings. In this contribution, we present the achievements in the development of 2D gratings with UV lithography and gold electroplating. Absorption gratings represented by periodic free-standing gold pillars with lateral structure sizes from 5 µm to 25 µm and heights from 5 µm to 28 µm have shown a high degree of periodicity and defect-free patterns. Grating performance was tested in a radiographic setup using a self-developed quality assessment algorithm based on the intensity distribution histograms. The algorithm allows the final user to estimate the suitability of a specific grating to be used in a particular setup.

The quality of high aspect ratio microstructures fabricated by deep X-ray lithography is highly dependent on the photoresist material used and the process parameters applied. Even with photoresists more suitable to this process, it is common to face defects in the final optical components, such as in case of X-ray gratings. The gratings need to be fabricated with critical dimensions on a sub-micrometer and micrometer scale, with periods of few micrometers and heights of hundreds of micrometers to be used in X-ray imaging techniques such as Talbot–Lau Interferometry. During the fabrication process, these features lead to challenges such as mechanical stability, homogeneity, and defect-free grating patterns. Usually, an epoxy-based negative photoresist is used in X-ray lithography, which needs to account for the shrinkage that takes place during polymer crosslinking in order to avoid defects in the final pattern. Nowadays, photoresist material still lacks certain suitable properties (chemical and mechanical) to fabricate gratings of high quality and with acceptable reproducibility. This work presents the results of TGA, FTIR, and MALDI-TOF analysis made on photoresists commercially available and suitable for X-ray lithography. The photoresists presented different profiles regarding the solvent content and oligomers composition, and in the case of some samples, there were high amounts of non-epoxidized oligomers.

HARMNST 2013 was held from April 22 to 24, 2013 in Berlin. Organised by micro resist technology, GmbH, HARMNST celebrated the 10th workshop continuing a biennial tradition that started in 1995 in Karlsruhe, Germany, and was visiting Madison, USA, Chiba, Japan, Baden–Baden, Germany, Monterey, USA, Gyeongju, Korea, Besançon, France, Saskatoon, Canada and Hsinchu, Taiwan in the last 20 years.