The article describes a comparative analysis of chromium coatings deposited by magnetron sputtering with and without ion assistance induced by a radiofrequency inductively coupled plasma (RF-ICP) source. Four series of 2 µm-thick Cr coatings were prepared, and then their cross-sectional microstructure, crystal structure and corrosion resistance were investigated by scanning and transmission electron microscopy, X-ray diffraction and a potentiodynamic polarization method. RF-ICP assistance led to significant enhancement (almost twofold) of ion current density in a substrate. The role of RF-ICP assistance in coating properties for planetary-rotated substrates was defined in terms of ion-to-atom ratio in particle flux entering a substrate. Calculations of particle and ion flux densities revealed an increase in ion-to-atom ratio from 0.18 to 1.43 and 0.11 to 0.84 in substrate positions distant from the magnetron sputtering systems depending on their design. RF-ICP assistance is beneficial for depositing dense Cr coatings with increased corrosion resistance in a 3.5 wt.% NaCl solution. The corrosion rate of AISI 321 steel can be decreased from 6.2 × 10⁻⁶ to 4.0 × 10⁻⁸ mm/year by deposition of the dense Cr coating.

The paper presents the results of a study examining the influence of deposition parameters of Ni coatings on their crystal structure, microstructure, and adhesion strength. Nickel coatings were deposited on a Cu−Nb wire of 0.5 mm in diameter using an inverted magnetron in two modes differing in bias potential at the initial step of Ni coating formation. It has been shown that higher bias potentials have a beneficial effect on the Ni coating microstructure and crack resistance. A study of the crystal structure of Ni coatings has revealed that increasing the bias potential at the initial stage of deposition initiates crystallite growth in the 200 and 220 directions.