Robert Kaplar

Dr. Robert Kaplar

orcid

Research Focus & Metrics

Academic Career Length

23Years (2004-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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4 December 2017 in Advanced Electronic Materials
Verified
Journal Article
Open access
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JTJ. Y. Tsao
J. Y. Tsao
SCS. Chowdhury
S. Chowdhury
MHM. A. Hollis
M. A. Hollis
DJD. Jena
D. Jena
NJN. M. Johnson
N. M. Johnson
JSJ. A. Simmons
J. A. Simmons
Ultrawide‐bandgap (UWBG) semiconductors, with bandgaps significantly wider than the 3.4 eV of GaN, represent an exciting and challenging new area of research in semiconductor materials, physics, devices, and applications. Because many figures‐of‐merit for device performance scale nonlinearly with bandgap, these semiconductors have long been known to have compelling potential advantages over their narrower‐bandgap cousins in high‐power and RF electronics, as well as in deep‐UV optoelectronics, quantum information, and extreme‐environment applications. Only recently, however, have the UWBG semiconductor materials, such as high Al‐content AlGaN, diamond and Ga2O3, advanced in maturity to the point where realizing some of their tantalizing advantages is a relatively near‐term possibility. In this article, the materials, physics, device and application research opportunities and challenges for advancing their state of the art are surveyed.

14 December 2021 in Journal of Materials Research
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Journal Article
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MWMan Hoi Wong
Man Hoi Wong
OBOliver Bierwagen
Oliver Bierwagen
RKRobert Kaplar
Robert Kaplar
HUHitoshi Umezawa
Hitoshi Umezawa

18 July 2016 in Applied Physics Letters
Verified
Journal Article
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ABAlbert G. Baca
Albert G. Baca
AAAndrew M. Armstrong
Andrew M. Armstrong
AAAndrew A. Allerman
Andrew A. Allerman
EDErica A. Douglas
Erica A. Douglas
CSCarlos A. Sanchez
Carlos A. Sanchez
RKRobert Kaplar
Robert Kaplar
An AlN barrier high electron mobility transistor (HEMT) based on the AlN/Al0.85Ga0.15N heterostructure was grown, fabricated, and electrically characterized, thereby extending the range of Al composition and bandgap for AlGaN channel HEMTs. An etch and regrowth procedure was implemented for source and drain contact formation. A breakdown voltage of 810 V was achieved without a gate insulator or field plate. Excellent gate leakage characteristics enabled a high Ion/Ioff current ratio greater than 107 and an excellent subthreshold slope of 75 mV/decade. A large Schottky barrier height of 1.74 eV contributed to these results. The room temperature voltage-dependent 3-terminal off-state drain current was adequately modeled with Frenkel-Poole emission.

17 January 2020 in Journal of Vacuum Science & Technology A
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Journal Article
Open access
PDF file
ABAlbert G. Baca
Albert G. Baca
AAAndrew M. Armstrong
Andrew M. Armstrong
BKBrianna A. Klein
Brianna A. Klein
AAAndrew A. Allerman
Andrew A. Allerman
EDErica A. Douglas
Erica A. Douglas
RKRobert Kaplar
Robert Kaplar
Research results for AlGaN-channel transistors are reviewed as they have progressed from low Al-content and long-channel devices to Al-rich and short-channel RF devices. Figure of merit (FOM) analysis shows encouraging comparisons relative to today’s state-of-the-art GaN devices for high Al-content and elevated temperatures. Critical electric field (EC), which fuels the AlGaN transistor FOM for high Al-composition, is not measured directly, but average gate-drain electric field at breakdown is substantially better in multiple reported AlGaN-channel devices compared to GaN. Challenges for AlGaN include the constraints arising from relatively low room temperature mobility dominated by ternary alloy scattering and the difficulty of making low-resistivity Ohmic contacts to high Al-content materials. Nevertheless, considerable progress has been made recently in the formation of low-resistivity Ohmic contacts to Al-rich AlGaN by using reverse compositional grading in the semiconductor, whereby a contact to a lower-Al alloy (or even to GaN) is made. Specific contact resistivity (ρc) approaching ρc ∼ 2 × 10−6 Ω cm2 to AlGaN devices with 70% Al-content in the channel has been reported. Along with scaling of the channel length and tailoring of the threshold voltage, this has enabled a dramatic increase in the current density, which has now reached 0.6 A/mm. Excellent ION/IOFF current ratios have been reported for Schottky-gated structures, in some cases exceeding 109. Encouraging RF performance in Al-rich transistors has been reported as well, with fT and fmax demonstrated in the tens of gigahertz range for devices with less than 150 nm gates. Al-rich transistors have also shown lesser current degradation over temperature than GaN in extreme high-temperature environments up to 500 °C, while maintaining ION/IOFF ratios of ∼106 at 500 °C. Finally, enhancement-mode devices along with initial reliability and radiation results have been reported for Al-rich AlGaN transistors. The Al-rich transistors promise to be a very broad and exciting field with much more progress expected in the coming years as this technology matures.

17 May 2021 in Applied Physics Letters
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MHMasataka Higashiwaki
Masataka Higashiwaki
RKRobert Kaplar
Robert Kaplar
JPJulien Pernot
Julien Pernot
Hongping ZhaoHongping Zhao
Hongping Zhao

19 May 2023 in IEEE Journal of Emerging and Selected Topics in Power Electronics
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Journal Article
Closed access
SMSudip K. Mazumder
Sudip K. Mazumder
LVLars Voss
Lars Voss
KDKaren M. Dowling
Karen M. Dowling
ACAdam Conway
Adam Conway
DHDavid Hall
David Hall
ACAlain B. Charles
Alain B. Charles
This manuscript provides an overview of power semiconductor devices (PSDs) for distributed energy resource (DER) system. To begin with an overview on electrically-triggered SiC and GaN devices followed by a brief narration of ultra-wide-bandgap (UWBG) PSDs. Subsequently, an overview of optically-activated PSDs encompassing photoconductive semiconductor switch (PCSS) and optical bipolar PSDs are provided. Finally, an overview of PSD packaging and reliability is captured.