Zhi Liu

Dr. Zhi Liu

orcid

Research Focus & Metrics

Academic Career Length

15Years (2012-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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25 October 2017 in Journal of Lightwave Technology
Verified
Journal Article
Closed access
ZLZhi Liu
Zhi Liu
FYFan Yang
Fan Yang
WWWenzhou Wu
Wenzhou Wu
Hui CongHui Cong
Hui Cong
JZJun Zheng
Jun Zheng
QWQiming Wang
Qiming Wang
High-performance normal-incidence p-i-n Ge photodetectors for 1550 and 1310 nm were grown by selective epitaxial growth on SOI substrate with in situ thermal annealing and surface Si passivation. Bulk leakage current density and surface leakage density as low as 3.4 mA/cm$^2$ and 0.4 μA/cm are achieved under -1 V, respectively. Resonance optical responsivity at 1550 and 1310 nm are 0.27 and 0.59 A/W under zero-bias, respectively. A 3-dB bandwidth as high as 48 GHz is obtained at -3 V. Clear open eye diagrams at 40 Gbps are demonstrated under zero-bias at 1550 nm.

21 March 2022 in Applied Physics Letters
Verified
Journal Article
Closed access
PDF file
MLMingming Li
Mingming Li
JZJun Zheng
Jun Zheng
XLXiangquan Liu
Xiangquan Liu
YZYupeng Zhu
Yupeng Zhu
CNChaoqun Niu
Chaoqun Niu
BCBuwen Cheng
Buwen Cheng
The Sn composition graded GeSn layer with Sn content increased from 11% to 14.3% was grown on a Si substrate by molecular beam epitaxy. The structural properties of the GeSn layer are investigated, and the film is gradually relaxed along the thickness, reaching approximately 71.6%. The GeSn p–i–n detectors were fabricated by using a complementary metal oxide semiconductor compatible process. The GeSn detectors demonstrated a cutoff wavelength of approximately 3.3 μm at room temperature with a dark current of 0.3 A/cm2 @ -1 V. At a wavelength of 2000 nm, the GeSn detectors had a responsivity of 110 mA/W and -3 dB bandwidth (f3 dB) about 3 GHz. These results suggest that high Sn content relax GeSn can be grown by MBE and paves the way toward the feasibility of mid-infrared GeSn photonics.

11 March 2021 in IEEE Photonics Journal
Verified
Journal Article
Open access
NWNan Wang
Nan Wang
CXChunlai Xue
Chunlai Xue
FWFengshuo Wan
Fengshuo Wan
YZYue Zhao
Yue Zhao
GXGuoyin Xu
Guoyin Xu
QWQiming Wang
Qiming Wang
We report the design and fabrication of a high-speed GeSn normal-incidence p-i-n photodetector. To realize high-speed detection in all telecommunication bands, we optimize the Sn content in the absorption layer, the absorption-layer thickness, and the device size. The responsivity of the 18-m-diameter device at 1550 nm reaches 0.32 A/W with an extended cutoff wavelength of 1700 nm and a 3-dB bandwidth as high as 28 GHz under 3 V bias, clear open eye diagrams are also obtained under zero bias at 1630 nm. All the results indicate that the device has a significant potential for applications in Si-based optical telecommunication in all telecommunication bands.

9 June 2013 in Discover Nano
Verified
Journal Article
Open access
PDF file
CZChunqian Zhang
Chunqian Zhang
CLChuan bo Li
Chuan bo Li
ZLZhi Liu
Zhi Liu
JZJun Zheng
Jun Zheng
CXChunlai Xue
Chunlai Xue
QWQiming Wang
Qiming Wang
The enhanced room-temperature photoluminescence of porous Si nanowire arrays and its mechanism are investigated. Over 4 orders of magnitude enhancement of light intensity is observed by tuning their nanostructures and surface modification. It is concluded that the localized states related to Si-O bonds and self-trapped excitations in the nanoporous structures are attributed to the strong light emission.

23 June 2022 in Optics Letters
Verified
Journal Article
Closed access
PDF file
YZYupeng Zhu
Yupeng Zhu
ZLZhi Liu
Zhi Liu
CNChaoqun Niu
Chaoqun Niu
YPYaqing Pang
Yaqing Pang
DZDiandian Zhang
Diandian Zhang
BCBuwen Cheng
Buwen Cheng
A compact high-power germanium photodetector (Ge PD) is experimentally demonstrated by re-engineering light distribution in the absorber. Compared with a conventional Ge PD, the proposed structure shows a DC saturation photocurrent improved by 28.9% and 3 dB bandwidth as high as 49.5 GHz at 0.1 mA. Under the same photocurrent of 10.5 mA, the proposed Ge PD shows a 3 dB bandwidth of 11.1 GHz, which is almost double the conventional Ge PD (5.6 GHz). The 25 Gb/s eye-diagram measurement verifies the improved power handling capability. The compact size and manufacturing simplicity of this structure will enable new applications for integrated silicon photonics.

1 August 2018 in Journal of Applied Physics
Verified
Journal Article
Closed access
PDF file
ZLZhi Liu
Zhi Liu
JLJietao Liu
Jietao Liu
BCBuwen Cheng
Buwen Cheng
JZJun Zheng
Jun Zheng
CLChuanbo Li
Chuanbo Li
QWQiming Wang
Qiming Wang
We propose a thin-film Ge-on-Si-on-insulator (Ge-on-SOI) photodetector with enhanced performance by exploiting induced guided mode resonance (GMR) employing Ge/SiO2 grating on Si-on-insulator (SOI). Numerically calculated results and theoretical analysis demonstrate that normal-incidence light can be coupled to the GMR and partly be converted into the spatial resonance mode which propagates along the whole properly designed grating structure. A notable absorption efficiency of higher than 70% is obtained in the photodetector with only 280 nm-thick Ge/SiO2 grating, which is about 35 times larger than that of the counterpart without the designed grating structure. Remarkable enhanced light absorption can be achieved in the device with very few grating periods, which significantly promotes a theoretical 3-dB bandwidth-efficiency product of ∼66 GHz. The result is promising for a compact Ge-on-Si photodetector design with low dark current, high-bandwidth, and high-responsivity.