The lossy nature of plasmonic wave due to absorption is shown to become an advantage for scaling-up a large area surface nanotexturing of transparent dielectrics and semiconductors by a self-organized sub-wavelength energy deposition leading to an ablation pattern—ripples—using this plasmonic nano-printing. Irreversible nanoscale modifications are delivered by surface plasmon polariton (SPP) using: (i) fast scan and (ii) cylindrical focusing of femtosecond laser pulses for a high patterning throughput. The mechanism of ripple formation on ZnS dielectric is experimentally proven to occur via surface wave at the substrate–plasma interface. The line focusing increase the ordering quality of ripples and facilitates fabrication over wafer-sized areas within a practical time span. Nanoprinting using SPP is expected to open new applications in photo-catalysis, tribology, and solar light harvesting via localized energy deposition rather scattering used in photonic and sensing applications based on re-scattering of SPP modes into far-field modes.

Nanoscale surface texturing, drilling, cutting, and spatial sculpturing, which are essential for applications, including thin-film solar cells, photonic chips, antireflection, wettability, and friction drag reduction, require not only high accuracy in material processing, but also the capability of manufacturing in an atmospheric environment. Widely used focused ion beam (FIB) technology offers nanoscale precision, but is limited by the vacuum-working conditions; therefore, it is not applicable to industrial-scale samples such as ship hulls or biomaterials, e.g., cells and tissues. Here, we report an optical far-field-induced near-field breakdown (O-FIB) approach as an optical version of the conventional FIB technique, which allows direct nanowriting in air. The writing is initiated from nanoholes created by femtosecond-laser-induced multiphoton absorption, and its cutting “knife edge” is sharpened by the far-field-regulated enhancement of the optical near field. A spatial resolution of less than 20 nm (λ/40, with λ being the light wavelength) is readily achieved. O-FIB is empowered by the utilization of simple polarization control of the incident light to steer the nanogroove writing along the designed pattern. The universality of near-field enhancement and localization makes O-FIB applicable to various materials, and enables a large-area printing mode that is superior to conventional FIB processing.

Femtosecond laser machining of biomimetic micro/nanostructures with high aspect ratio (larger than 10) on ultrahard materials, such as sapphire, is a challenging task, because the uncontrollable surface damage usually results in poor surface structures, especially for deep scribing. Here, we report an inside-out femtosecond laser deep scribing technology in combination with etching process for fabricating bio-inspired micro/nanostructures with high-aspect-ratio on sapphire. To effectively avoid the uncontrollable damage at the solid/air interface, a sacrificial layer of silicon oxide was employed for surface protection. High-quality microstructures with an aspect ratio as high as 80:1 have been fabricated on sapphire surface. As a proof-of-concept application, we produced a moth-eye inspired antireflective window with sub-wavelength pyramid arrays on sapphire surface, by which broadband (3–5 μm) and high transmittance (98% at 4 μm, the best results reported so far) have been achieved. The sacrificial layer assisted inside-out femtosecond laser deep scribing technology is effective and universal, holding great promise for producing micro/nanostructured optical devices.