Fuhua Gao

Prof. Fuhua Gao

orcid

Research Focus & Metrics

Academic Career Length

28Years (1999-Present)

(Calculated once Scilit publication data is synced: current year − year of first publication + 1)

Representative Publications

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27 September 2021 in Physical Review A
Verified
Journal Article
Closed access
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JZJunfan Zhu
Junfan Zhu
AWAn Wang
An Wang
XLXiong Liu
Xiong Liu
YLYurong Liu
Yurong Liu
ZZZhiyou Zhang
Zhiyou Zhang
FGFuhua Gao
Fuhua Gao
The wave function is the cornerstone of quantum mechanics, although it is still open to different interpretations. It has been shown that the amplitude and the phase of a wave function are manifested in the imaginary and real parts of the momentum weak value, respectively. Based on this, we develop a weak measurement scheme to reconstruct the wave function through measuring the momentum weak value. A proof-of-principle experiment is made to confirm the feasibility of our measurement scheme, in which the polarization states and the momentum of light are coupled. We believe the experimental protocol has the potential to be applied in diverse fields such as wave-front sensing, edge detection, and optical communication, and measurement of the momentum weak value may offer valuable insight to better understand quantum mechanics.

16 March 2021 in Physical Review A
Verified
Journal Article
Closed access
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JZJunfan Zhu
Junfan Zhu
ZLZhaoxue Li
Zhaoxue Li
YLYurong Liu
Yurong Liu
YYYucheng Ye
Yucheng Ye
QTQian Ti
Qian Ti
FGFuhua Gao
Fuhua Gao
Weak measurement as a nonperturbative theory has been shown to be powerful in the fundamentals of quantum mechanics and high-precision metrology, in which the pointer is of great importance to parameter estimation and experimental design. In this work, we find that under the conditions of weak coupling and Gaussian meter, the probability distribution after the postselection follows a bimodal function and the peak contrast ratio (PCR) can be applied as a special pointer, which is different from the shift of mean value. To obtain the PCR, only two values corresponding to the two peaks in the distribution function are required. We theoretically present the relation of the PCR and parameters to be estimated, and then demonstrate it in an experiment. Weak measurement with the PCR pointer has the advantages of reducing the requirements of the apparatus and suppressing noise, which also provides a heuristic approach for studying weak measurement when the weak value is very large.

1 March 2014 in Microelectronic Engineering
Verified
Journal Article
Closed access
YSYarong Su
Yarong Su
SYSong Ye
Song Ye
YHYidong Hou
Yidong Hou
SSSha Shi
Sha Shi
SLShuhong Li
Shuhong Li
JDJinglei Du
Jinglei Du

30 November 2023 in Rare Metals
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Journal Article
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YWYi‐Fan Wang
Yi‐Fan Wang
SHShan‐Shan Huang
Shan‐Shan Huang
ZDZhen‐Dong Dai
Zhen‐Dong Dai
SXShi‐Lin Xian
Shi‐Lin Xian
XWXuan‐Nan Wu
Xuan‐Nan Wu
YHYidong Hou
Yidong Hou

25 March 2024 in Applied Physics Letters
Verified
Journal Article
Open access
PDF file
YWYifan Wang
Yifan Wang
JZJunfan Zhu
Junfan Zhu
JWJiguo Wu
Jiguo Wu
RGRongchun Ge
Rongchun Ge
FGFuhua Gao
Fuhua Gao
ZZZhiyou Zhang
Zhiyou Zhang
In the field of sensing technology, there is a trade-off between sensitivity and dynamic range. This paper proposes a high-precision weak measurement sensing method with flexible sensitivity adjustment to achieve matching between sensitivity and dynamic range. We demonstrate that precise control over sensitivity can be achieved by adjusting the bandwidth and coupling strength of the probe in frequency domain. In the experiment, the sensitivity ranges from 104 to 105RIU−1, and the precision ranges from 10−7 to 10−8 RIU. Additionally, the decomposition of hydrogen peroxide was precisely measured. Our measurement scheme can facilitate broader application of weak measurement technology in precision sensing.

27 January 2005
Verified
Conference Paper
Closed access
PDF file
CLChi Liu
Chi Liu
XGXiaowei Guo
Xiaowei Guo
FGFuhua Gao
Fuhua Gao
BLBoliang Luo
Boliang Luo
XDXi Duan
Xi Duan
CQChuankai Qiu
Chuankai Qiu
A maskless lithography imaging simulation using digital micromirror device (DMD) was investigated. The DMD acts as a reflective spatial light modulator. The micro-mirrors on DMD can be instructed by the computer to tilt them ±12° off their normal position which produces a mask pattern, and then the mask pattern can be carried onto the surface of wafer by the imaging system. Because the imaging of the maskless lithography is a complex process, it is necessary to simulate and analyze its practical process. In this paper, we present a partial coherent imaging model of maskless lithography considering the practical projection characterization of DMD. With the model, it is convenient to simulate the lithography of arbitrarily shaped microstructure using DMD. Through calculation, the spatial image in maskless lithography process based on gray scale photolithography with DMD real-time masks was obtained.