This is the second part of the paper ‘Paradigm shifts in surface metrology’. In part I, the three historical paradigm shifts in surface metrology were brought together, and the subsequent evolution resulting from the shifts discussed. The historical philosophy highlighted the fact that the paradigm shifts must be robust and flexible, meaning that surface metrology must allow for full control of surface manufacture and provide an understanding of the surface functional performance. Part II presents the current paradigm shift as a ‘stepping stone’, building on the above historical context. Aspects of surface geometry will also have to cater for surfaces derived from disruptive application, i.e. structured and freeform surfaces are identified candidates. The current shift is presented in three aspects: from profile to areal characterization; from stochastic to structured surfaces; and from simple geometries to complex freeform geometries, all spanning the millimetre to sub-nanometre scales. In this paradigm shift, the scale of surface texture is beginning to approach some of the geometrical features in micro/nano electro-mechanical systems devices and is becoming one of the most important functionality indicators. Part II will contextualize the current shifts in the discipline of surface metrology, and cement surface metrology in place in the ultra precision and nanotechnology age.

An important step of phase calculation-based fringe projection systems is 3D calibration, which builds up the relationship between an absolute phase map and 3D shape data. The existing 3D calibration methods are complicated and hard to implement in practical environments due to the requirement of a precise translating stage or gauge block. This paper presents a 3D calibration method which uses a white plate with discrete markers on the surface. Placing the plate at several random positions can determine the relationship of absolute phase and depth, as well as pixel position and X, Y coordinates. Experimental results and performance evaluations show that the proposed calibration method can easily build up the relationship between absolute phase map and 3D shape data in a simple, flexible and automatic way.

Surface texture and its measurement are becoming the most critical factors and important functionality indicators in the performance of high precision and nanoscale devices and components. Surface metrology as a discipline is currently undergoing a huge paradigm shift: from profile to areal characterization, from stochastic to structured surfaces, and from simple geometries to complex free-form geometries, all spanning the millimetre to sub-nanometre scales. This paper builds a complete philosophical framework for surface metrology through a review of the paradigm shifts that have occurred in the discipline of surface metrology, tracing the development of fundamental philosophies and techniques. The paper starts with a brief overview of the historical paradigm shifts and builds an up-to-date foundational philosophy, capable of rapid and effective development. The growth in interest in surface metrology stems mainly from the need to control the manufacture of armaments during the Second World War and the production of domestic goods and appliances since that time. The surfaces produced by manufacture seemed to offer the possibility of being useful for process control. Unfortunately, only a few tentative investigations had been carried out to establish usable relationships between the processes, the machine tools and the available surface parameters (with their limitations). Even fewer investigations had been carried out to relate surface geometry to the performance of manufactured products. The result was that the metrology was unprepared and, consequently, the progress was sporadic. This overall review is given in two parts. Part I focuses on the historical philosophy of surface metrology and Part II discusses the progress within the current paradigm shift.

We introduce a new optical interferometry system for fast areal surface measurement of microscale and nanoscale surfaces that are immune to environmental noise. Wavelength scanning interfero metry together with an acousto-optic tunable filtering technique is used to measure surfaces with large step heights. An active servo control system serves as a phase-compensating mechanism to eliminate the effects of environmental noise. The system can be used for online or in-process measurement on a shop floor. Measurement results from two step height standard samples and a structured surface of a semiconductor daughterboard are presented. In comparison with standard step height specimens, the system achieved nanometer measurement accuracy. The measurement results of the semiconductor daughterboard, under mechanical disturbance, showed that the system can withstand environmental noise.