Optical methods in nanolithography have been traditionally limited by Abbe’s diffraction limit. One method able to overcome this barrier is apertureless scanning probe lithography assisted by laser. This technique has demonstrated surface nanostructuring below the diffraction limit. In this study, we demonstrate how a femtosecond Yb-doped fiber laser oscillator running at high repetition rate of 46 MHz and a pulse duration of 150 fs can serve as the laser source for near-field nanolithography. Subwavelength features were generated on the surface of gold films down to a linewidth of 10 nm. The near-field enhancement in this apertureless scanning probe lithography setup could be determined experimentally for the first time. Simulations were in good agreement with the experiments. This result supports near-field tip-enhancement as the major physical mechanisms responsible for the nanostructuring.

Ultrashort pulse laser induced processes in the nanotechnology at interfaces are presented. A special focus is placed on femtosecond far field investigations of defect generation in solids [1-4] and on electrochemical in-situ techniques in graphene nanosheet synthesis [5]. Further, deterministic nanostructuring of solids and hot electron electrochemistry is discussed [6]. Apertureless scanning near-field nanolithography with a femtosecond Yb-doped fiber laser oscillator allows non-thermal electromagnetic energy transfer [7]. [1] W. Kautek and O. Armbruster, Springer Series in Materials Science 191 (2014) 43-66. [2] O. Armbruster, A. Naghilou, M. Kitzler, W. Kautek, J. Phys. Chem. C 119 (2015) 22992−22998. [3] O. Armbruster, A. Naghilou, M. Kitzler, W. Kautek, Appl. Surf. Sci. 396 (2017) 1736–1740. [4] A. Naghilou, O. Armbruster, W. Kautek, Appl. Surf. Sci. 418 (2017) 487-490. [5] M. Pfaffeneder-Kmen, I. Falcon Casas, A. Naghilou, G. Trettenhahn, W. Kautek, Electrochim. Acta 255 (2017) 160-167. [6] O. Armbruster, H. Pöhl, W. Kautek, (2018), in publication. [7] I. Falcón Casas, W. Kautek, Nanomaterials 8 (2018) 536