After dominating the electronics industry for decades, silicon is on the verge of becoming the material of choice for the photonics industry: the traditional stronghold of III-V semiconductors. Stimulated by a series of recent breakthroughs and propelled by increasing investments by governments and the private sector, silicon photonics is now the most active discipline within the field of integrated optics. This paper provides an overview of the state of the art in silicon photonics and outlines challenges that must be overcome before large-scale commercialization can occur. In particular, for realization of integration with CMOS very large scale integration (VLSI), silicon photonics must be compatible with the economics of silicon manufacturing and must operate within thermal constraints of VLSI chips. The impact of silicon photonics will reach beyond optical communication-its traditionally anticipated application. Silicon has excellent linear and nonlinear optical properties in the midwave infrared (IR) spectrum. These properties, along with silicon's excellent thermal conductivity and optical damage threshold, open up the possibility for a new class of mid-IR photonic devices

A platform for the realization of tightly-confined lithium niobate photonic devices and circuits on silicon substrates is reported based on wafer bonding and selective oxidation of refractory metals. The heterogeneous photonic platform is employed to demonstrate high-performance lithium niobate microring optical resonators and Mach-Zehnder optical modulators. A quality factor of ~7.2 × 10⁴ is measured in the microresonators, and a half-wave voltage-length product of 4 V.cm and an extinction ratio of 20 dB is measured in the modulators.

Compact electro-optical modulators are demonstrated on thin films of lithium niobate on silicon operating up to 50 GHz. The half-wave voltage length product of the high-performance devices is 3.1 V.cm at DC and less than 6.5 V.cm up to 50 GHz. The 3 dB electrical bandwidth is 33 GHz, with an 18 dB extinction ratio. The third-order intermodulation distortion spurious free dynamic range is $97.3{\mathrm{dB}\mathrm{Hz}}^{2/3}$ at 1 GHz and $92.6{\mathrm{dBHz}}^{2/3}$ at 10 GHz. The performance demonstrated by the thin-film modulators is on par with conventional lithium niobate modulators but with lower drive voltages, smaller device footprints, and potential compatibility for integration with large-scale silicon photonics.

The excellent electro-optic (EO) and nonlinear optical properties of lithium niobate (${\mathrm{LiNbO}}_3$ or LN) have long established it as a prevailing photonic material for the long-haul telecom modulator and wavelength-converter markets. Indeed, the first nonlinear experiment in any waveguide platform was a demonstration of Cherenkov radiation from titanium-diffused LN.¹ Conventional LN waveguides are most commonly formed by in-diffusion of titanium (Ti) dopants² or by the proton exchange process.³ However, these conventional lithium niobate optical waveguides have a low index-contrast, hence are bulky compared with modern integrated platforms, such as silicon photonics. The bulkiness impedes photonic circuit implementations and imposes high optical power requirements for nonlinear applications.

Chip-scale implementations of second-order nonlinear optics benefit from increased optical confinement that can lead to nonlinear interaction strengths that are orders of magnitude higher than bulk free-space configurations. Here, we present thin-film-based ultraefficient periodically-poled lithium niobate nonlinear waveguides, leveraging actively-monitored ferroelectric domain reversal engineering and nanophotonic confinement. The devices exhibit up to 4600 %W⁻¹cm⁻² conversion efficiency for second-harmonic generation, pumped around 1540 nm. In addition, we measure broadband sum-frequency generation across multiple telecom bands, from 1460 to 1620 nm. As an immediate application of the devices, we use pulses of picojoule-level energy to demonstrate second-harmonic generation with over 10% conversion in a 0.6-mm-long waveguide. Our ultracompact and highly efficient devices address growing demands in integrated-photonic frequency conversion, frequency metrology, atomic physics, and quantum optics, while offering a coherent link between the telecom and visible bands.