This study systematically investigated the effects of oxygen plasma treatment on oxygen vacancy defects in sputtered β-gallium oxide (β-Ga₂O₃) films and their corresponding ultraviolet (UV) detection performance. The sputtered β-Ga₂O₃ film subjected to 1 min of oxygen plasma treatment exhibited optimal photodetection properties. Compared to the untreated sample, the dark current was reduced by approximately one order of magnitude to 0.378 pA at 10 V bias. It exhibited an 86% (from 2.92 s to 0.41 s) decrease in response time, a 41.6% increase in photocurrent, a very high photo-to-dark current ratio of 9.18 × 10⁵, and a specific detectivity of 2.62 × 10¹⁰ cm·Hz^1/2W⁻¹ under 254 nm UV illumination intensity of 799 μW/cm² at 10 V bias. Notably, appropriate oxygen plasma treatment minimizes electron capture, enhances the separation and collection of photogenerated carriers, and suppresses the persistent photoconductivity (PPC) effect, thus ultimately shortening the response time. Oxygen plasma processing thus provides an effective approach to fabricating high-performance β-Ga₂O₃ solar-blind photodetectors (SBPDs).