Direct assembling of N-graphene, i.e. nitrogen doped graphene, in a controllable manner was achieved using microwave plasmas at atmospheric pressure conditions. The synthesis is accomplished via a single step using ethanol and ammonia as carbon and nitrogen precursors. Tailoring of the high-energy density plasma environment results in a selective synthesis of N-graphene (~0.4% doping level) in a narrow range of externally controlled operational conditions, i.e. precursor and background gas fluxes, plasma reactor design and microwave power. Applying infrared (IR) and ultraviolet (UV) irradiation to the flow of free-standing sheets in the post-plasma zone carries out changes in the percentage of sp², the N doping type and the oxygen functionalities. X-ray photoelectron spectroscopy (XPS) revealed the relative extension of the graphene sheets π-system and the type of nitrogen chemical functions present in the lattice structure. Scanning Electron microscopy (SEM), Transmission Electron microscopy (TEM) and Raman spectroscopy were applied to determine morphological and structural characteristics of the sheets. Optical emission and FT-IR spectroscopy were applied for characterization of the high-energy density plasma environment and outlet gas stream. Electrochemical measurements were also performed to elucidate the electrochemical behavior of NG for supercapacitor applications.

Self-standing graphene sheets were synthesized using microwave plasmas driven by surface waves at 2.45 GHz stimulating frequency and atmospheric pressure. The method is based on injecting ethanol molecules through a microwave argon plasma environment, where decomposition of ethanol molecules takes place. The evolution of the ethanol decomposition was studied in situ by plasma emission spectroscopy. Free gas-phase carbon atoms created in the plasma diffuse into colder zones, both in radial and axial directions, and aggregate into solid carbon nuclei. The main part of the solid carbon is gradually withdrawn from the hot region of the plasma in the outlet plasma stream where nanostructures assemble and grow. Externally forced heating in the assembly zone of the plasma reactor has been applied to engineer the structural qualities of the assembled nanostructures. The synthesized graphene sheets have been analysed by Raman spectroscopy, scanning electron microscopy, high-resolution transmission electron microscopy and x-ray photoelectron spectroscopy. The presence of sp3 carbons is reduced by increasing the gas temperature in the assembly zone of the plasma reactor. As a general trend, the number of mono-layers decreases when the wall temperature increases from 60 to 100 °C. The synthesized graphene sheets are stable and highly ordered.