Due to their versatile and unique properties, tantalum-based thin films have been extensively studied. However, tantalum is susceptible to oxidation due to its higher chemical activity, which is crucial regardless of whether oxidations of Ta are beneficial or detrimental. Therefore, the oxidation of Ta during material processing, especially without conscious means, should be taken seriously. In this study, pure Ta films were fabricated by magnetron sputtering under set procedure parameters. The effects of base pressure and substrate temperature on the degree of oxidation of Ta films were investigated. The results revealed that the magnitude of the base pressure directly affects the oxidation state of the as-deposited Ta films. When preferably avoiding the oxidation of sputtered Ta films, the base pressure should be controlled below 4.4 × 10⁻⁴ Pa. The substrate temperature has little effect on the oxidation state of the as-deposited Ta films under a base pressure ranging from about 10⁻² Pa to 10⁻⁴. We hope that this study can provide some references for controlling the oxidation states of Ta involved in relevant film preparation.

Pure WS₂ films were prepared by the radio frequency sputtering of a WS₂ target with the initial substrate temperature controlled to −40, −25, 0 °C and room temperature by cooling the holder with liquid nitrogen, respectively. The influence of the substrate temperature on the microstructures and the tribological properties of the prepared films have been evaluated and the wear mechanism of the films was explained. It revealed that with decreasing the substrate temperature, the prepared WS₂ film changed from the loose and coarse columnar plate structure for film deposited at room temperature to a much more compact morphology for film deposited at −40 °C. The WS₂ film deposited at low temperature of −40 or −25 °C exhibited a long wear life higher than 5.0 × 10⁵ sliding cycles, while this was about 1.5 × 10⁵ cycles for the WS₂ deposited at room temperature. The improved tribological properties for the low temperature-deposited film were mainly attributed to the much lower wear rate resulted from the compact structure as well as the sustained and steadily formed transform layer on the counterpart ball.

Electroless Ni–P coatings are widely used for corrosion and wear protection, yet their ability to deliver water-based superlubricity and the role of phosphorus content remain insufficiently understood. Here, electroless Ni–P coatings with four P contents (3.4, 6.4, 9.0, and 12.4 wt%) were deposited on GCr15 steel with nearly constant thickness and comparable initial roughness, and were tested against Si₃N₄ balls in neutral 0.5 M NaH₂PO₂ solution. Friction measurements, together with surface topography characterization and tribofilm analysis, were used to link P content with tribofilm chemistry and superlubricity. All coatings achieved macroscale superlubricity, exhibiting steady-state friction coefficients below 0.01, while the running-in time decreased markedly as P content increased. During sliding, the wear tracks underwent mechano-chemical polishing to Sa ≈ 11–12 nm and formed phosphate–silicate tribofilms enriched in P–O and Si–O species on both the coating and the counterface. These findings establish a composition–tribofilm–superlubricity relationship in the Ni–P/NaH₂PO₂ system and demonstrate that P-content optimization is an effective internal design lever to accelerate running-in, mitigate wear, and achieve robust superlubricity under neutral aqueous lubrication.