Shichun Wang is currently a Master’s candidate at the School of Light Industry and Chemical Engineering, Guangdong University of Technology, and a Researcher at Jihua Laboratory. His research focuses on the development of cyanide-free gold electroplating formulations for semiconductor applications and the investigation of additive action mechanisms in electroplating systems. Dedicated to advancing green electroplating technology for semiconductor manufacturing, he has systematically explored sulfite-based cyanide-free gold plating processes, addressing core challenges such as bath instability, coating blackening, and insufficient adhesion through the optimization of complexing agents, stabilizers, and functional additives. He employs a combination of electrochemical techniques (including cyclic voltammetry, linear sweep voltammetry, and rotating disk electrode measurements) and surface characterization methods (such as scanning electron microscopy and energy-dispersive X-ray spectroscopy) to reveal the adsorption behavior of additives on electrode surfaces and their regulatory effects on gold electrocrystallization. His work aims to bridge the gap between fundamental research and industrial application, providing practical solutions for the green transformation of semiconductor gold plating.
Shichun Wang is currently a Master’s candidate at the School of Light Industry and Chemical Engineering, Guangdong University of Technology, and a Researcher at Jihua Laboratory. His research focuses on the development of cyanide-free gold electroplating formulations for semiconductor applications and the investigation of additive action mechanisms in electroplating systems. Dedicated to advancing green electroplating technology for semiconductor manufacturing, he has systematically explored sulfite-based cyanide-free gold plating processes, addressing core challenges such as bath instability, coating blackening, and insufficient adhesion through the optimization of complexing agents, stabilizers, and functional additives. He employs a combination of electrochemical techniques (including cyclic voltammetry, linear sweep voltammetry, and rotating disk electrode measurements) and surface characterization methods (such as scanning electron microscopy and energy-dispersive X-ray spectroscopy) to reveal the adsorption behavior of additives on electrode surfaces and their regulatory effects on gold electrocrystallization. His work aims to bridge the gap between fundamental research and industrial application, providing practical solutions for the green transformation of semiconductor gold plating.